Research Initiation: Stable Crack Growth in Thin Structures

研究启动：薄结构中的稳定裂纹扩展

• 批准号: 8809177
• 负责人: Pedro Ponte Castaneda
• 金额: $ 3.57万
• 依托单位: Johns Hopkins University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1988
• 资助国家: 美国
• 起止时间: 1988-06-01 至 1990-09-01
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8809177&HistoricalAwards=false
• 关键词: Research; Initiation; Stable; Crack; Growth

The objective of this research is to study theoretically stable crack growth in thin structures. Such structures have been observed experimentally to tolerate large increments of load after the onset of crack growth. The final results will be presented in the form of material resistance curves, which will eventually provide the design basis for more efficient and yet safe thin structures.

本研究的目的是从理论上研究薄壁结构中裂纹的稳定扩展。实验观察到，这种结构在裂纹扩展开始后能够承受较大的载荷增量。最终结果将以材料阻力曲线的形式给出，最终将为更高效、更安全的薄壁结构提供设计依据。