Engineering Research Equipment Grant: Supporting Equipment for Scanning Tip Microscopy
Engineering Research Equipment Grant: Supporting Equipment for Scanning Tip Microscopy
批准号:
8906893
负责人:
Dror Sarid
金额:
$5.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1989
资助国家:
美国
项目状态:
已结题
起止时间:
1989-08-15 至 1991-01-31
中文摘要
已在该中心建立了一个扫描尖端显微镜实验室。 亚利桑那大学光学科学中心,旨在 表征用于非线性光学的隔离半导体团簇 交互. 特征化设施是一个关键的环节, 在光波领域工作的制造和应用小组 技术,因为它使定制制造媒体成为可能, 符合应用要求。 实验室能力包括 扫描隧道显微镜(STM),扫描力显微镜(SFM), 近场扫描光学显微镜(NSOM) 收购 几件设备将增强这些能力。 1. 一般用途:需要频谱分析仪来监测 在相互作用过程中存在的声学和机械噪声, 尖端和样本。 一台频谱分析仪将为六台 不同的正在进行的实验努力。 2. 超高真空STM:半导体需要Knudsen光源 制造,磁性旋转驱动器运输样品,以及LEED 和用于表面分析的俄歇。 3. 溅射枪和电源。 4. 分子模拟计算机
英文摘要
A scanning tip microscopy laboratory has been established at the Optical Sciences Center, University of Arizona, which aims to characterize isolated semiconductor clusters used for nonlinear optics interactions. The characterization facility is a crucial link between fabrication and application groups working in the field of lightwave technology, because it makes possible tailoring the fabricated media to the applications requirements. The laboratory capabilities include scanning tunneling microscopy (STM), scanning force microscopy (SFM), and near-field scanning optical microscopy (NSOM). Acquisition of several pieces of equipment would enhance these capabilities. 1. General purpose: a spectrum analyzer is needed to monitor the acoustical and mechanical noise that exists during the interaction of the tip and sample. A single spectrum analyzer will serve six different ongoing experimental efforts. 2. UHV-STM: a Knudsen source is needed for semiconductor fabrication, a magnetic rotary drive to transport samples, and a LEED and Auger for surface analysis. 3. Sputtering gun and power supply. 4. Molecular Modeling Computer.
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Characterization of Semiconductor Clusters by Four-Wave Mixing and Scanning
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Characterization of Quantum Drops for Optical Applications Using Scanning Tunneling Microscopy
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Power-Dependent Refractive-Index Phenomena in Optical Wave- guides
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依托单位:
The Properties of the Antisymmetric Surface Plasma Wave Propagating on Very Thin Metal Films
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依托单位:
国内基金
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