Synthesis and Characterization of Boron Nitride Masks for X-Ray Lithography

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The process of producing boron nitride membranes with the required properties will be established. A fundamental understanding of the inter-relationships governing deposition conditions, composition, and film properties will be achieved X-ray masks incorporation the optimal boron nitride membrane properties will be produced and tested for radiation hardness. The effects of accelerated exposure testing on the properties of membranes will be ascertained and issuing technological challenges addressed.