Presidential Young Investigator Award

本PYI的研究与半导体的光学特性有关。他的主要研究方向是光散射，是研究拉曼散射干涉效应的先驱。他目前的一些研究涉及半导体异质结构界面的光散射。他还与G. Maracas合作，研究应变层半导体异质结中的品牌偏移的物理和工程。在非晶锡锗合金的生长和表征方面，也与H. Hochst进行了第二次合作。PYI奖将允许该研究人员完成一个复杂的光散射实验室的安装，并集中精力开辟新的研究领域。

This PYI's research is associated with the optical properties of semiconductors. His principal activity has been in the area of light scattering and he was a pioneer in studying interference effects in Raman scattering. Some of his current research involves light scattering from semiconductor heterostructure interfaces. He is also collaborating with G. Maracas on the physics and engineering of brand offsets in strained-layer semiconductor heterojunctions. There is also a second collaboration with H. Hochst in the growth and characterization of amorphous tin-germanium alloys. The PYI award will allow this investigator to complete the installation of a sophisticated light scattering laboratory and to concentrate in opening new research areas.