Modeling and Characterization of an ECR Plasma Reactor for Semiconductor Processing Applications

微波电子回旋共振（ECR）等离子体反应器在半导体加工中的蚀刻和薄膜沉积应用中显示出良好的潜力。ECR等离子体处理技术的进一步发展需要对反应器的运行进行更好的了解和表征。这个研究启动奖项目是通过数值模拟技术和诊断技术来研究ECR等离子体。本研究的目的是探讨空间均匀性的物种和电子。这些研究的意义在于，它们将产生反应器的预测模型，并通过指导未来的应用来改进等离子体反应器。所研究的ECR等离子体反应器由单模微波腔组成，该腔向具有多极静态磁场的等离子体产生区提供能量。用于验证和完善数值模型的实验诊断数据包括激光诱导荧光光谱、相干反斯托克斯拉曼光谱、发射光谱，光谱学，电场探测，磁场探测，离子能量分析，和朗缪尔探针测量。

Microwave electron cyclotron resonance (ECR) plasma reactors have demonstrated excellent potential in etching and thin-film deposition applications for semiconductor processing. The further development of ECR plasma processing technology requires that the operation of the reactors be better understood and characterized. This Research Initiation Award project is investigating ECR plasmas through numerical modeling techniques and diagnostic techniques. The objectives of this study are to investigate the spatial uniformity species and electrons. The significance of these studies is that they will produce a predictive model of the reactors and improve the plasma reactors by directing future applications. The ECR plasma reactor studied consist of a single mode microwave cavity that supplies the energy to a plasma production region which has a multipolar static magnetic field. The experimental diagnostics data to be utilized to verify and refine the numerical models includes data collected using laser induced fluorescence spectroscopy, coherent anti-Stokes Raman spectroscopy, emission spectroscopy, actinometry, electric field probing, magnetic field probing, ion energy analysis, and Langmuir probe measurements.