Modeling and Characterization of an ECR Plasma Reactor for Semiconductor Processing Applications
Modeling and Characterization of an ECR Plasma Reactor for Semiconductor Processing Applications
批准号:
9110313
负责人:
Timothy Grotjohn
金额:
$6.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1991
资助国家:
美国
项目状态:
已结题
起止时间:
1991-08-15 至 1994-01-31
中文摘要
微波电子回旋 共振(ECR)等离子体反应器具有 在以下方面表现出了出色的潜力: 蚀刻和薄膜沉积 半导体应用 处理. 进一步发展 ECR等离子体处理技术 要求操作的 更好地理解反应堆, 表征了 本研究 启动奖项目是 研究ECR等离子体, 数值模拟技术和 诊断技术。 的 本研究的目的是 研究空间均匀性 物种和电子 的 这些研究的意义在于 他们会预测 反应器的模型和改进 等离子体反应器 未来的应用。 ECR等离子体 研究的反应堆由单个 模式微波腔, 产生等离子体的能量 多极静态区域 磁场 实验 诊断数据将用于 核实和完善数字 模型包括使用 激光诱导荧光 光谱学,相干反斯托克斯 拉曼光谱,发射 光谱学、光化测量学、电学 场探测,磁场 探测,离子能量分析, 朗缪尔探针测量。
英文摘要
Microwave electron cyclotron resonance (ECR) plasma reactors have demonstrated excellent potential in etching and thin-film deposition applications for semiconductor processing. The further development of ECR plasma processing technology requires that the operation of the reactors be better understood and characterized. This Research Initiation Award project is investigating ECR plasmas through numerical modeling techniques and diagnostic techniques. The objectives of this study are to investigate the spatial uniformity species and electrons. The significance of these studies is that they will produce a predictive model of the reactors and improve the plasma reactors by directing future applications. The ECR plasma reactor studied consist of a single mode microwave cavity that supplies the energy to a plasma production region which has a multipolar static magnetic field. The experimental diagnostics data to be utilized to verify and refine the numerical models includes data collected using laser induced fluorescence spectroscopy, coherent anti-Stokes Raman spectroscopy, emission spectroscopy, actinometry, electric field probing, magnetic field probing, ion energy analysis, and Langmuir probe measurements.
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依托单位:
海外基金