NSF/DOE Partnership in Basic Plasma Science and Engineering: Scaling of Microwave Plasma Sources to Small Dimensions
NSF/DOE 基础等离子体科学与工程合作:微波等离子体源缩小尺寸
基本信息
- 批准号:0078480
- 负责人:
- 金额:$ 32.82万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:2000
- 资助国家:美国
- 起止时间:2000-09-01 至 2005-02-28
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This NSF/DOE collaborative research project between researchers at Michigan State University and Northeastern University will investigate and establish the scientific basis and engineering principles for the design and operation of small microwave plasma sources with discharge dimensions ranging from 0.3-10 mm. Small microwave discharges operate with low input power, while having very high power densities and highly reactive species outputs. The availability of physically compact microwave power sources built for mobile communication systems combined with small microwave plasma sources opens the possibility of many unique microwave plasma applications. The research project will experimentally evaluate and theoretically model the behavior of very small microwave discharges, i.e. millimeter and submillimeter size discharges. Two microwave plasma systems will be used including a highly flexible and adjustable testbed plasma source and a micromachined, microstrip line-based plasma source. The research methodology is to study, using experimental diagnostics and electromagnetic/plasma simulation models, discharges with diameters ranging from 10 mm to 0.3 mm in the testbed plasma source. Then, this testbed source knowledge will be used to design, build and test micromachined, microstrip line based plasma sources. Some of the possible applications include plasma sources for MEMS-scale chemical analysis, micro-thrusters for spacecraft, miniature electrodeless light sources, and miniature sources for spatially focused, plasma-assisted chemical vapor deposition. This project will demonstrate two applications including diamond deposition on small substrate areas and micro-plasmas for portable, low temperature sterilization.
这个NSF/DOE合作研究项目之间的研究人员在密歇根州立大学和东北大学将调查和建立的科学基础和工程原理的设计和操作的小型微波等离子体源的放电尺寸范围从0.3-10毫米。小型微波放电操作低输入功率,同时具有非常高的功率密度和高活性物质输出。 为移动的通信系统构建的物理上紧凑的微波功率源与小型微波等离子体源相结合的可用性开启了许多独特的微波等离子体应用的可能性。 该研究项目将对非常小的微波放电(即毫米和亚毫米尺寸放电)的行为进行实验评估和理论建模。 将使用两个微波等离子体系统,包括一个高度灵活和可调的试验台等离子体源和一个微机械,微带线为基础的等离子体源。 研究方法是研究,使用实验诊断和电磁/等离子体模拟模型,放电直径范围从10毫米到0.3毫米的试验台等离子体源。 然后,这个测试平台的源知识将被用来设计,建立和测试微机械,微带线为基础的等离子体源。一些可能的应用包括用于MEMS尺度化学分析的等离子体源、用于航天器的微型推进器、微型无电极光源和用于空间聚焦的微型源、等离子体辅助化学气相沉积。该项目将展示两种应用,包括金刚石沉积在小衬底面积和微型等离子体便携式,低温灭菌。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Timothy Grotjohn其他文献
Timothy Grotjohn的其他文献
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{{ truncateString('Timothy Grotjohn', 18)}}的其他基金
DMREF: Doping and Defects in Diamond for Electronics
DMREF:电子产品金刚石的掺杂和缺陷
- 批准号:
1628958 - 财政年份:2016
- 资助金额:
$ 32.82万 - 项目类别:
Standard Grant
Computer-Integrated Ion, Free Radical and UV Light Sources for Micromanufacturing Workcell
用于微制造工作单元的计算机集成离子、自由基和紫外光源
- 批准号:
0500372 - 财政年份:2005
- 资助金额:
$ 32.82万 - 项目类别:
Standard Grant
NSF/DoE Partnership in Basic Plasma Science and Engineering:Microwave Discharge Heating and Stability for Plasma-Assisted Processing Sources
NSF/DoE 在基础等离子体科学与工程领域的合作:等离子体辅助处理源的微波放电加热和稳定性
- 批准号:
9713298 - 财政年份:1997
- 资助金额:
$ 32.82万 - 项目类别:
Standard Grant
Modeling and Characterization of an ECR Plasma Reactor for Semiconductor Processing Applications
用于半导体加工应用的 ECR 等离子体反应器的建模和表征
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9110313 - 财政年份:1991
- 资助金额:
$ 32.82万 - 项目类别:
Standard Grant
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