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NSF/DOE Partnership in Basic Plasma Science and Engineering: Scaling of Microwave Plasma Sources to Small Dimensions

NSF/DOE Partnership in Basic Plasma Science and Engineering: Scaling of Microwave Plasma Sources to Small Dimensions
NSF/DOE 基础等离子体科学与工程合作:微波等离子体源缩小尺寸
批准号:
0078480
负责人:
Timothy Grotjohn
金额:
$32.82万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-09-01 至 2005-02-28

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中文摘要
翻译
这项由密歇根州立大学和东北大学的研究人员联合开展的NSF/DOE合作研究项目,将为设计和运行放电尺寸为0.3-10 mm的小型微波等离体源提供科学依据和工程原理。小的微波放电以低输入功率运行,同时具有非常高的功率密度和高活性物质输出。为移动通信系统构建的物理结构紧凑的微波功率源与小型微波等离子体源相结合,为许多独特的微波等离子体应用打开了可能性。该研究项目将对非常小的微波放电,即毫米波和亚毫米波的放电行为进行实验评估和理论建模。将使用两个微波等离子体系统,包括高度灵活和可调的试验台等离子体源和微机械、微带线等离子体体源。研究方法是利用实验诊断和电磁/等离子体模拟模型,研究实验台等离子体源中直径从10 mm到0.3 mm的放电。然后,这些测试床源知识将用于设计、制造和测试基于微机械、微带线的等离子体源。一些可能的应用包括用于MEMS规模化学分析的等离子体源,用于航天器的微推进器,微型无电极光源,以及用于空间聚焦的等离子体辅助化学气相沉积的微型光源。该项目将展示两种应用,包括在小基板上沉积钻石和用于便携式低温灭菌的微型等离子体。
英文摘要
This NSF/DOE collaborative research project between researchers at Michigan State University and Northeastern University will investigate and establish the scientific basis and engineering principles for the design and operation of small microwave plasma sources with discharge dimensions ranging from 0.3-10 mm. Small microwave discharges operate with low input power, while having very high power densities and highly reactive species outputs. The availability of physically compact microwave power sources built for mobile communication systems combined with small microwave plasma sources opens the possibility of many unique microwave plasma applications. The research project will experimentally evaluate and theoretically model the behavior of very small microwave discharges, i.e. millimeter and submillimeter size discharges. Two microwave plasma systems will be used including a highly flexible and adjustable testbed plasma source and a micromachined, microstrip line-based plasma source. The research methodology is to study, using experimental diagnostics and electromagnetic/plasma simulation models, discharges with diameters ranging from 10 mm to 0.3 mm in the testbed plasma source. Then, this testbed source knowledge will be used to design, build and test micromachined, microstrip line based plasma sources. Some of the possible applications include plasma sources for MEMS-scale chemical analysis, micro-thrusters for spacecraft, miniature electrodeless light sources, and miniature sources for spatially focused, plasma-assisted chemical vapor deposition. This project will demonstrate two applications including diamond deposition on small substrate areas and micro-plasmas for portable, low temperature sterilization.
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DMREF: Doping and Defects in Diamond for Electronics
  • 批准号:
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  • 项目类别:
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  • 资助金额:
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  • 财政年份:
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    9713298
  • 项目类别:
    Standard Grant
  • 资助金额:
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    9110313
  • 项目类别:
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  • 资助金额:
    $6.0万
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国内基金
海外基金
集成DOE的激光熔覆工艺及先进镍基高温合金熔覆质量控制机理研究
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  • 项目类别:
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  • 资助金额:
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  • 批准年份:
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  • 负责人:
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  • 依托单位: