NSF/DOE Partnership in Basic Plasma Science and Engineering: Scaling of Microwave Plasma Sources to Small Dimensions
NSF/DOE Partnership in Basic Plasma Science and Engineering: Scaling of Microwave Plasma Sources to Small Dimensions
批准号:
0078480
负责人:
Timothy Grotjohn
金额:
$32.82万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-09-01 至 2005-02-28
中文摘要
这个由密歇根州立大学和东北大学的研究人员组成的NSF/DOE合作研究项目将研究和建立小型微波等离子体源的设计和运行的科学基础和工程原理,放电尺寸范围为0.3-10毫米。小型微波放电以低输入功率运行,而具有非常高的功率密度和高反应性物质输出。为移动通信系统构建的物理紧凑的微波电源与小型微波等离子体源相结合,为许多独特的微波等离子体应用提供了可能性。该研究项目将实验评估和理论模拟非常小的微波放电行为,即毫米和亚毫米尺寸的放电。将使用两个微波等离子体系统,包括一个高度灵活和可调节的测试平台等离子体源和一个微机械微带线等离子体源。研究方法是利用实验诊断和电磁/等离子体模拟模型,研究在试验台等离子体源中直径范围为10 mm至0.3 mm的放电。然后,这些试验台源知识将用于设计、构建和测试基于微带线的微机械等离子体源。一些可能的应用包括用于mems尺度化学分析的等离子体源、用于航天器的微型推进器、微型无极光源以及用于空间聚焦、等离子体辅助化学气相沉积的微型光源。该项目将展示两种应用,包括在小衬底区域上沉积金刚石和用于便携式低温灭菌的微等离子体。
英文摘要
This NSF/DOE collaborative research project between researchers at Michigan State University and Northeastern University will investigate and establish the scientific basis and engineering principles for the design and operation of small microwave plasma sources with discharge dimensions ranging from 0.3-10 mm. Small microwave discharges operate with low input power, while having very high power densities and highly reactive species outputs. The availability of physically compact microwave power sources built for mobile communication systems combined with small microwave plasma sources opens the possibility of many unique microwave plasma applications. The research project will experimentally evaluate and theoretically model the behavior of very small microwave discharges, i.e. millimeter and submillimeter size discharges. Two microwave plasma systems will be used including a highly flexible and adjustable testbed plasma source and a micromachined, microstrip line-based plasma source. The research methodology is to study, using experimental diagnostics and electromagnetic/plasma simulation models, discharges with diameters ranging from 10 mm to 0.3 mm in the testbed plasma source. Then, this testbed source knowledge will be used to design, build and test micromachined, microstrip line based plasma sources. Some of the possible applications include plasma sources for MEMS-scale chemical analysis, micro-thrusters for spacecraft, miniature electrodeless light sources, and miniature sources for spatially focused, plasma-assisted chemical vapor deposition. This project will demonstrate two applications including diamond deposition on small substrate areas and micro-plasmas for portable, low temperature sterilization.
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DMREF: Doping and Defects in Diamond for Electronics
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批准号:1628958
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项目类别:Standard Grant
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资助金额:$100.0万
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财政年份:2016
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负责人:Timothy Grotjohn
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依托单位:
Computer-Integrated Ion, Free Radical and UV Light Sources for Micromanufacturing Workcell
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批准号:0500372
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项目类别:Standard Grant
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资助金额:$35.0万
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财政年份:2005
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负责人:Timothy Grotjohn
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依托单位:
NSF/DoE Partnership in Basic Plasma Science and Engineering:Microwave Discharge Heating and Stability for Plasma-Assisted Processing Sources
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批准号:9713298
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项目类别:Standard Grant
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资助金额:$30.0万
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财政年份:1997
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负责人:Timothy Grotjohn
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依托单位:
Modeling and Characterization of an ECR Plasma Reactor for Semiconductor Processing Applications
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批准号:9110313
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项目类别:Standard Grant
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资助金额:$6.0万
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财政年份:1991
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负责人:Timothy Grotjohn
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依托单位:
国内基金
海外基金
集成DOE的激光熔覆工艺及先进镍基高温合金熔覆质量控制机理研究
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批准号:51675303
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项目类别:面上项目
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资助金额:62.0万元
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批准年份:2016
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负责人:常保华
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依托单位: