NSF/DoE Partnership in Basic Plasma Science and Engineering:Microwave Discharge Heating and Stability for Plasma-Assisted Processing Sources

NSF/DoE 在基础等离子体科学与工程领域的合作：等离子体辅助处理源的微波放电加热和稳定性

• 批准号: 9713298
• 负责人: Timothy Grotjohn
• 金额: $ 30万
• 依托单位: Michigan State University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-09-01 至 2001-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9713298&HistoricalAwards=false
• 关键词: NSF; DoE; Partnership; Basic; Plasma

Microwave discharges have been developed and applied to a number of applications ranging from electron cyclotron resonance (ECR) plasma and ion sources for semiconductor etching and deposition to plasma-assisted CVD sources for diamond film. This research is directed toward the improved understanding of electromagnetic coupling and heating processes that take place in these physically bounded, high-density microwave discharges. The approach will combine experimental data which is obtained from carefully constructed experiments, with the analogous data front theoretical/numerical models, which are formulated to match the actual experiment. It is expected that results from this research will not only be the improved understanding of the fundamentals of microwave coupling and heating in bounded high-densitv discharges, but will also be the improved design and process controllability of these plasma sources. Theoretical modeling will also be performed at a more detailed numerical simulation level. The modeling effort will develop numerical simulation models for the behavior of microwave plasma sources which are capable of understanding and predicting source outputs, non-linearity, hysteresis and multiple steady states. Such an understanding of the external circuit control and the energy coupling (i.e., electromagnetic field structure, coupling, and plasma heating) within the plasma source is key to understanding source stability, process controllability and further to microwave plasma source scaling and uniformity design issues in the future.

微波放电已经被开发并应用于从用于半导体蚀刻和沉积的电子回旋共振（ECR）等离子体和离子源到用于金刚石膜的等离子体辅助CVD源的许多应用。 这项研究是针对改善理解的电磁耦合和加热过程中发生的这些物理界，高密度微波放电。 该方法将结合联合收割机的实验数据，这是从精心构建的实验，与类似的数据前的理论/数值模型，这是制定匹配的实际实验。 预计这项研究的结果将不仅是有界高密度放电中微波耦合和加热的基本原理的改进理解，而且也将是这些等离子体源的改进设计和工艺可控性。 还将在更详细的数值模拟水平上进行理论建模。 建模工作将为微波等离子体源的行为开发数值模拟模型，这些模型能够理解和预测源输出、非线性、滞后和多稳态。 这种对外部电路控制和能量耦合的理解（即，等离子体源内的电磁场结构、耦合和等离子体加热）是理解源稳定性、工艺可控性以及未来微波等离子体源缩放和均匀性设计问题的关键。