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Engineering Research Equipment Grant: Thin Film Deposition and Characterization

Engineering Research Equipment Grant: Thin Film Deposition and Characterization
工程研究设备补助金:薄膜沉积和表征
批准号:
9111625
负责人:
Michael Reed
金额:
$7.2万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1991
资助国家:
美国
项目状态:
已结题
起止时间:
1991-08-15 至 1993-01-31

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中文摘要
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英文摘要
We propose to acquire thin film deposition and characterization equipment for use in our ongoing and future research programs, including sample preparation benches, a modern and flexible sputter deposition and thermal evaporation system, and ellipsometer. The deposition system will be used to deposit a variety of conducting (Au,Al,Zn,In,etc.) and dielectric (ZnO,SiO2,etc.) films and will be used by a large number of faculty and students. An automated ellipsometer will be used to characterize the films produced by the deposition system and our existing chemical vapor deposition (CVD) reactors.
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