Workshop on Epitaxy, Interfaces, Defects and Processing of Electronic and Photonic Materials, Pittsburgh, PA, November 1991

电子和光子材料外延、界面、缺陷和加工研讨会，宾夕法尼亚州匹兹堡，1991 年 11 月

• 批准号: 9119932
• 负责人: Subhash Mahajan
• 金额: $ 2.5万
• 依托单位: Carnegie-Mellon University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1991
• 资助国家: 美国
• 起止时间: 1991-09-01 至 1993-02-28
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9119932&HistoricalAwards=false
• 关键词: Workshop; Epitaxy; Interfaces; Defects; Processing

This objective of this project is to assess the field of "Epitaxy, Interfaces, Defects, and Processing of Electronic and Photonic Materials." A workshop will be held with presentations by prominent scientists actively working in the field. The workshop will encompass the following topics: Fundamental aspects of two- and three-dimensional growth; Atomic structure of interfaces and defects; Growth and processing of electronic and photonic materials using novel concepts. The basic idea of the workshop is to delineate the critical scientific issues pertaining to these topics, and to discuss approaches or techniques needed to address them. A written report will be prepared and disseminated.

本项目的目的是评估“外延、界面、缺陷和电子与光子材料的加工”领域。将举办一个讲习班，由在该领域积极工作的著名科学家作报告。讲习班将包括以下主题：二维和三维增长的基本方面；界面和缺陷的原子结构；使用新概念的电子和光子材料的生长和加工。研讨会的基本思想是描述与这些主题相关的关键科学问题，并讨论解决这些问题所需的方法或技术。将编写和散发一份书面报告。