Contactless Electromodulation for the In-Situ Study and Characterization of Semiconductor Growth/Processing

基础研究旨在提高对 半导体的生长和加工，以及电子 异质结构的性能，通过开发和使用 先进的非接触式光电调制方法， 将进行反射和电反射。 一个主要 这些方法的优点是它们可以原位使用， 在真实的时间有效地改善先进的控制 半导体生长和后续处理以及 提供基本电子信息， 这些材料的特性。建立的研究基地将 用于改善材料参数如合金成分， 肖特基势垒高度、界面质量、阱宽 量子阱结构和超晶格。 %%% 这项研究有望提供更深入的基础知识。 了解半导体生长和加工， 异质结构的基本电子性质。 从 应用程序的角度来看，了解这些过程和 这些特性有益于半导体器件设计， 捏造 从总体上看，结果将具有重要意义 大规模、高速集成电路技术 电子电路

Fundamental research directed toward improved understanding of growth and processing of semiconductors, and the electronic properties of heterostructures through the development and use of advanced contactless electromodulation methods of photore- flectance and electroreflectance will be conducted. A major advantage of these methods is that they can be used in situ and in real time for effective improvement in the control of advanced semiconductor growth and subsequent processing as well as providing fundamental information on the basic electronic properties of these materials. The research base established will serve to improve materials parameters such as alloy composition, Schottky barrier heights, interfacial quality, well width in quantum well structures and superlattices. %%% This research is expected to provide deeper fundamental understanding of semiconductor growth and processing, and the fundamental electronic properties of heterostructures. From an application point of view, understanding these processes and properties is beneficial to semiconductor device design and fabrication. The results will be of importance in a general way to the technology of large scale, high speed integrated electronic circuits.