Contactless Electromodulation for the In-Situ Study and Characterization of Semiconductor Growth/Processing

通过开发和使用先进的光反射和电反射的非接触式电调制方法，将进行基础研究，以提高对半导体生长和加工的理解，以及异质结构的电子特性。这些方法的一个主要优点是，它们可以在现场和实时使用，有效地改善对先进半导体生长和后续加工的控制，并提供有关这些材料的基本电子特性的基本信息。该研究基地的建立将有助于改善材料参数，如合金成分、肖特基势垒高度、界面质量、量子阱结构和超晶格中的阱宽度等。这项研究有望对半导体的生长和加工以及异质结构的基本电子特性提供更深入的基础理解。从应用的角度来看，了解这些过程和性质对半导体器件的设计和制造是有益的。研究结果对大规模、高速集成电路技术具有普遍意义。

Fundamental research directed toward improved understanding of growth and processing of semiconductors, and the electronic properties of heterostructures through the development and use of advanced contactless electromodulation methods of photore- flectance and electroreflectance will be conducted. A major advantage of these methods is that they can be used in situ and in real time for effective improvement in the control of advanced semiconductor growth and subsequent processing as well as providing fundamental information on the basic electronic properties of these materials. The research base established will serve to improve materials parameters such as alloy composition, Schottky barrier heights, interfacial quality, well width in quantum well structures and superlattices. %%% This research is expected to provide deeper fundamental understanding of semiconductor growth and processing, and the fundamental electronic properties of heterostructures. From an application point of view, understanding these processes and properties is beneficial to semiconductor device design and fabrication. The results will be of importance in a general way to the technology of large scale, high speed integrated electronic circuits.