Conference: Support of the 35th International Symposium on Electron, Ion and Photon Beams, Seattle, Washington, May 28-31, 1991

这一建议是为了支持学生参加1991年5月28日至31日在华盛顿西雅图举行的第35届电子、离子和光子光束国际研讨会。研讨会将涵盖纳米制造、微加工、电子和离子光刻、x射线光刻、粒子束光学以及纳米制造的前沿应用等领域的最新研究成果。在这个会议上，来自世界各地的研究小组的最新研究通常首先被报道。会议论文集将发表在《真空科学与技术》杂志上。

This proposal is for support of student travel to the 35th International Symposium on Electron, Ion and Photon Beams, in Seattle, Washington, May 28-31, 1991. The symposium will cover the latest research results in the fields of nanofabrication, microfabrication, electron and ion lithographies, x- ray lithography, particle beam optics, and forefront applications of nanofabrication. At this conference the latest research from groups around the world are usually reported first. The proceedings of the conference will be published in the Journal of Vacuum Science and Technology.