High Temperature Superconducting Coatings on Non-Planar Surface

非平面表面高温超导涂层

• 批准号: 9160123
• 负责人: Anton Greenwald
• 金额: $ 4.99万
• 依托单位: Spire Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-01-01 至 1992-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9160123&HistoricalAwards=false
• 关键词: Temperature; Superconducting; Coatings; Non; Planar

Metalorganic chemical vapor deposition (MOCVD) of high temperature superconducting materials has been shown to be feasible, and films deposited to date on flat substrates have electrical properties comparable to the best reported results. However, to take advantage of MOCVD to coat odd shapes, such as the inside of rf cavities, requires innovative techniques. This is a proposal to test the feasibility of one such technique, using MOCVD for production of a seed crystal layer deposited slowly, one atomic layer at a time, on a non-planar substrate. The bulk of the film can then be deposited at high rates, which should produce high quality yttrium-barium-copper-oxide films with excellent crystal orientation and surface quality. As a test article of practical importance, we propose to coat the inside of a hollow cylindrical rf cavity. Radio frequency characterization of the film deposited on a flat surface will be performed in Phase I.

高温超导材料的金属有机化学气相沉积（MOCVD）已被证明是可行的，迄今为止在平坦基底上沉积的薄膜具有与最佳报道结果相当的电性能。 然而，要利用 MOCVD 来涂覆奇怪的形状（例如射频腔的内部），需要创新技术。 这是一项测试此类技术可行性的提议，即使用 MOCVD 来生产在非平面基板上缓慢沉积的籽晶层，一次一个原子层。 然后可以以高速率沉积大部分薄膜，这将产生具有优异晶体取向和表面质量的高质量钇钡铜氧化物薄膜。 作为具有实际意义的测试物品，我们建议对空心圆柱形射频腔的内部进行涂层。 沉积在平坦表面上的薄膜的射频特性将在第一阶段进行。