Metalorganic Chemical Vapor Deposition of High Temperature Superconducting Films

金属氧化物的金属有机化学气相沉积是电子工业中一种成熟的技术，用于生产具有定制性能的薄膜绝缘体和透明导体。应用于新型超导陶瓷材料，可以在氧气中制备不需要烧结的薄膜，可以在单晶衬底上外延生长的薄膜，以及成分和晶相均匀的极高纯度的薄膜。第一阶段的目的是证明用金属有机化学气相沉积的方法在氧化锆、氧化铝、涂层氧化铝或钛酸锶上沉积出均匀的、表面光滑的超导薄膜。

Metalorganic chemical vapor deposition of metallic oxides is an established technology in the electronics industry for production of thin film insulators and transparent conductors with tailored properties. Applied to the new superconducting ceramic materials this process could produce films in oxygen which do not require sintering, films which may grow epitaxially on single crystal substrates and films of exceptionally high purity with uniform composition and crystal phases. The objective of Phase I is to demonstrate that metalorganic chemical vapor deposition of yttrium-barium-copper-oxide on zirconia, alumina, coated alumina or strontium titanate yields a uniform superconducting film with a smooth surface.