Metalorganic Chemical Vapor Deposition of High Temperature Superconducting Films
Metalorganic Chemical Vapor Deposition of High Temperature Superconducting Films
批准号:
8861267
负责人:
Anton Greenwald
金额:
$5.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1989
资助国家:
美国
项目状态:
已结题
起止时间:
1989-01-01 至 1989-09-30
中文摘要
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英文摘要
Metalorganic chemical vapor deposition of metallic oxides is an established technology in the electronics industry for production of thin film insulators and transparent conductors with tailored properties. Applied to the new superconducting ceramic materials this process could produce films in oxygen which do not require sintering, films which may grow epitaxially on single crystal substrates and films of exceptionally high purity with uniform composition and crystal phases. The objective of Phase I is to demonstrate that metalorganic chemical vapor deposition of yttrium-barium-copper-oxide on zirconia, alumina, coated alumina or strontium titanate yields a uniform superconducting film with a smooth surface.
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