Structure/Property Studies of Nitride Films: The Role of Hydrogen Incorporation

氮化物薄膜的结构/性能研究：氢掺入的作用

• 批准号: 9201767
• 负责人: Kerry Hipps
• 金额: $ 30.4万
• 依托单位: Washington State University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-09-01 至 1996-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9201767&HistoricalAwards=false
• 关键词: Structure; Property; Studies; Nitride; Films

This project outlined a comprehensive investigation analyzing and relating the microscopic characteristics of AlN, AlN:H, Si3N4, and Si3N4:H thinfilms with their macroscopic properties. Molecular structure of the films will be determined by complementary vibrational techniques, FTIR, and Raman spectroscopy. STM, SFM, SEM, EDX, and XRD are used to characterize the films' microsctructures. Special emphasis will be placed on determining the role of hydrogen in these films. The motivation for this work is to improve the understanding of how microscopic details ( molecular structure and microsctructure) control the chemical and mechanical properties of thin films. %%%% This study investigates the role of hydrogen incorporation on the properties of the thin films. AlN and Si3N4 films are used for this study. Molecular structure of the film will be determined, and it will be used to correlated with the microscopic and macroscopic properties of the film. This study will provide useful information for the fundamental undrstanding of how microscopic details, such as molecular structure and microsctructure, control the chemical and mechanical properties of thin films.

本项目对AlN、AlN：H、Si3N4和Si3N4：H薄膜的微观特征与宏观性能进行了全面的分析和关联。薄膜的分子结构将通过互补振动技术、FTIR和拉曼光谱来确定。采用扫描隧道显微镜、扫描电子显微镜、能谱分析和X射线衍射仪对薄膜的微观结构进行了表征。将特别强调确定氢在这些薄膜中的作用。这项工作的动机是提高对微观细节(分子结构和微结构)如何控制薄膜的化学和机械性能的理解。%本研究探讨了氢掺杂对薄膜性能的影响。本研究使用了AlN和Si3N4薄膜。确定了薄膜的分子结构，并将其与薄膜的微观和宏观性能进行了关联。这项研究将为从根本上理解分子结构和微结构等微观细节如何控制薄膜的化学和机械性能提供有用的信息。