Structure/Property Studies of Nitride Films: The Role of Hydrogen Incorporation

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This project outlined a comprehensive investigation analyzing and relating the microscopic characteristics of AlN, AlN:H, Si3N4, and Si3N4:H thinfilms with their macroscopic properties. Molecular structure of the films will be determined by complementary vibrational techniques, FTIR, and Raman spectroscopy. STM, SFM, SEM, EDX, and XRD are used to characterize the films' microsctructures. Special emphasis will be placed on determining the role of hydrogen in these films. The motivation for this work is to improve the understanding of how microscopic details ( molecular structure and microsctructure) control the chemical and mechanical properties of thin films. %%%% This study investigates the role of hydrogen incorporation on the properties of the thin films. AlN and Si3N4 films are used for this study. Molecular structure of the film will be determined, and it will be used to correlated with the microscopic and macroscopic properties of the film. This study will provide useful information for the fundamental undrstanding of how microscopic details, such as molecular structure and microsctructure, control the chemical and mechanical properties of thin films.