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REG: Industrial Applications of Plasma Science

REG: Industrial Applications of Plasma Science
REG:等离子体科学的工业应用
批准号:
9212432
负责人:
Francis Chen
金额:
$3.22万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-08-15 至 1994-07-31

项目摘要

项目成果

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中文摘要
翻译
根据这项工程研究设备赠款,加州大学洛杉矶分校电气工程系将购买真空吸尘器,电子和诊断设备,将致力于支持工程研究。该设备将在致力于低温等离子体物理工业应用的实验室中使用。受益于这笔赠款的项目将包括:a)开发用于半导体芯片和液晶显示器的大面积等离子刻蚀机;B)为新的粒子加速器开发高密度等离子体柱,增加相干光源;C)调查工业和天体物理等离子体中尘埃和微粒的行为;以及d)聚变等离子体反应堆中使用的壁材的研究。
英文摘要
Under this Engineering Research Equipment Grant, the Electrical Engineering Department of the University of California, Los Angeles, will purchase vacuum, electronic, and diagnostic equipment which will be dedicated to support research in engineering. The equipment will be used in a laboratory devoted to industrial applications of low Temperature Plasma Physics. Projects benefiting from this grant will include a) development of large-area plasma etching machines for semiconductor chips and liquid crystal displays; b) development of dense plasma columns for new particle accelerators add coherent light sources; c) investigations on the behavior of dust and particulates in industrial and astrophysical plasmas; and d) studies of wall materials used in fusion plasma reactors.
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会议论文
A Novel Plasma Tool for Large-Area Materials Processing
Physics of Charge Damage in High Density Plasma Etchers
High Density Sources for Plasma Processing
  • 批准号:
    9400849
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $35.25万
  • 财政年份:
    1994
  • 负责人:
    Francis Chen
  • 依托单位:
Plasma Production for New Applications
  • 批准号:
    8901249
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $32.08万
  • 财政年份:
    1989
  • 负责人:
    Francis Chen
  • 依托单位:
海外基金