REG: Industrial Applications of Plasma Science

根据这项工程研究设备拨款，加州大学洛杉矶分校电气工程系将购买真空、电子、以及诊断设备，这些设备将专门用于支持工程研究。该设备将在一个致力于低温等离子体物理工业应用的实验室中使用。受益于该资助的项目将包括：a)开发用于半导体芯片和液晶显示器的大面积等离子蚀刻机；B)开发用于新型粒子加速器的致密等离子体柱，增加相干光源；C)工业和天体物理等离子体中尘埃和微粒行为的研究；d)用于聚变等离子体反应堆的壁材研究。

Under this Engineering Research Equipment Grant, the Electrical Engineering Department of the University of California, Los Angeles, will purchase vacuum, electronic, and diagnostic equipment which will be dedicated to support research in engineering. The equipment will be used in a laboratory devoted to industrial applications of low Temperature Plasma Physics. Projects benefiting from this grant will include a) development of large-area plasma etching machines for semiconductor chips and liquid crystal displays; b) development of dense plasma columns for new particle accelerators add coherent light sources; c) investigations on the behavior of dust and particulates in industrial and astrophysical plasmas; and d) studies of wall materials used in fusion plasma reactors.