Research Equipment Grant: Novel Plasma Assisted Vapor Deposition
Research Equipment Grant: Novel Plasma Assisted Vapor Deposition
批准号:
9212950
负责人:
Walajabad Sampath
金额:
$5.11万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-09-01 至 1994-02-28
中文摘要
点击翻译按钮获取中文摘要
英文摘要
Cadmium electroplating in cyanide baths is of significant environmental concern. In addition, by-products of cadmium coatings release toxic substances in the environment during their use and disposal. As a consequence, a unique, environmentally and occupationally safe dry plating concept has been developed. The dry plating concept utilizes a novel plasma assisted vapor deposition process and an in situ reclaim technique for cadmium. This dry plating is economical for coating and waste management.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
IUCRC Phase III Colorado State University: Center for a Solar Powered Future (SPF2050)
-
批准号:2052735
-
项目类别:Continuing Grant
-
资助金额:$25.0万
-
财政年份:2021
-
负责人:Walajabad Sampath
-
依托单位:
I/UCRC Phase II at Colorado State University: Center for Next Generation Photovoltaics
-
批准号:1821526
-
项目类别:Continuing Grant
-
资助金额:$20.0万
-
财政年份:2018
-
负责人:Walajabad Sampath
-
依托单位:
I/UCRC Phase II: Next Generation Photovoltaics
-
批准号:1540007
-
项目类别:Continuing Grant
-
资助金额:$22.5万
-
财政年份:2015
-
负责人:Walajabad Sampath
-
依托单位:
PFI:AIR-RA: Advanced Thin-Film Photovoltaics for Sustainable Energy
-
批准号:1538733
-
项目类别:Standard Grant
-
资助金额:$75.0万
-
财政年份:2015
-
负责人:Walajabad Sampath
-
依托单位:
AIR: Next Generation CdTe Photovoltaic Technology
-
批准号:1127362
-
项目类别:Standard Grant
-
资助金额:$99.38万
-
财政年份:2011
-
负责人:Walajabad Sampath
-
依托单位:
I/UCRC for Next Generation Photovoltaics
-
批准号:0968987
-
项目类别:Continuing Grant
-
资助金额:$39.5万
-
财政年份:2010
-
负责人:Walajabad Sampath
-
依托单位:
Planning Grant: I/UCRC for Next Generation Photovoltaics
-
批准号:0856034
-
项目类别:Standard Grant
-
资助金额:$0.95万
-
财政年份:2009
-
负责人:Walajabad Sampath
-
依托单位:
New Technologies for the Environment: Continuous Belt Air to Vacuum to Air (AVA) Technology for Remanufacturing and Recycling in High Technology Industries
-
批准号:0086666
-
项目类别:Standard Grant
-
资助金额:$9.98万
-
财政年份:2000
-
负责人:Walajabad Sampath
-
依托单位:
Continuous Air to Vacuum to Air (AVA) High Throughput Vacuum Deposition of Thin Films
-
批准号:9713699
-
项目类别:Continuing Grant
-
资助金额:$20.77万
-
财政年份:1997
-
负责人:Walajabad Sampath
-
依托单位:
Engineering Research Equipment Grant for Residual Gas Analyzers for Novel Semiconductor Film Growth
-
批准号:9622282
-
项目类别:Standard Grant
-
资助金额:$1.42万
-
财政年份:1996
-
负责人:Walajabad Sampath
-
依托单位:
High Throughput Vacuum Desposition of Thin Films
-
批准号:9412919
-
项目类别:Continuing Grant
-
资助金额:$20.33万
-
财政年份:1994
-
负责人:Walajabad Sampath
-
依托单位:
Engineering Research Equipment Grant: Equipment for High Speed Blank Casting
-
批准号:9006585
-
项目类别:Standard Grant
-
资助金额:$0.5万
-
财政年份:1990
-
负责人:Walajabad Sampath
-
依托单位:
Engineering Research Equipment Grant: Equipment for Resistance Measurement of Superconducting Particles
-
批准号:8806144
-
项目类别:Standard Grant
-
资助金额:$0.95万
-
财政年份:1988
-
负责人:Walajabad Sampath
-
依托单位:
Ultrahigh Current Density Nitrogen Ion Implantation-- Effects on the Microstructure and High Cycle Fatigue Properties
-
批准号:8700688
-
项目类别:Continuing Grant
-
资助金额:$9.0万
-
财政年份:1987
-
负责人:Walajabad Sampath
-
依托单位:
Manufacturing Process for Thin Walled Casting of Intricate Shapes
-
批准号:8619586
-
项目类别:Standard Grant
-
资助金额:$2.97万
-
财政年份:1987
-
负责人:Walajabad Sampath
-
依托单位:
海外基金