Continuous Air to Vacuum to Air (AVA) High Throughput Vacuum Deposition of Thin Films

DMI-9713699 SAMPATH本研究的目的是研究物理气相沉积(PVD)源，提高对空-真空-空(AVA)高通量真空镀膜工艺中蒸汽源和工艺监控的认识。研究的重点包括对汽源流量的均匀性和对均匀源电荷耗尽的建模，以获得更多的了解。还将研究汽源控制策略，以了解现场传感器对过程控制的要求。这些定量模型将通过薄膜器件和光伏半导体薄膜的沉积和研究得到实验验证。本研究对PVD蒸汽源的了解在包括平板显示器和光伏产业在内的大量薄膜产业中具有潜在的应用前景。此外，所提出的改善薄膜均匀性、均匀电荷耗尽和原位温度测量的研究将对许多真空镀膜行业具有直接的好处。对于未来更大的晶圆尺寸来说，情况尤其如此。

DMI-9713699 Sampath This research is to investigate the physical vapor deposition (PVD) source and to increase the understanding of the vapor source and process monitoring for the Air to Vacuum to Air (AVA) high throughput vacuum deposition of thin films process. The research focus involves modeling both the vapor source flux uniformity and on uniform source charge depletion to gain an increased understanding. The vapor source control strategy will also be studied to understand in-situ sensor requirements for process control. These quantitative models will be experimentally verified through the deposition and study of semiconductor thin films for thin film devices and photovoltaics. This research in understanding of the PVD vapor source has potential applications in a large number of thin film industries, including flat panel display and photovoltaic industries. In addition, the proposed research on improved film uniformity and uniform charge depletion and in-situ temperature measurement would have direct benefits to many vacuum deposition industries. This is especially true for bigger wafer size in the future.