High Throughput Vacuum Desposition of Thin Films

点击翻译按钮获取中文摘要

9412919 Sampath The goal of this research is to investigate the effects of process parameters (deposition rate and ambient pressure) on the properties, grain size and electrical conductivity, of thin films. The methodology of statistical design of experiments will be applied to the development of the experimental plan and the analysis of results. Thin films are widely used in many applications, including photovoltaic devices. Thin films are deposited in industry by wet chemical methods and vacuum processes. The vacuum deposition method produces thin films of superior quality and generates little or no hazardous waste. However, the major disadvantage is the low throughput associated with batch processing in vacuum. This research will seek to deposit CdS and CdTe thin films using an air- vacuum-air process that is environmentally benign.