High Throughput Vacuum Desposition of Thin Films

本研究的目的是研究工艺参数（沉积速率和环境压力）对薄膜性能、晶粒尺寸和电导率的影响。实验统计设计的方法将应用于实验计划的制定和结果的分析。薄膜广泛应用于许多应用，包括光伏器件。薄膜在工业上是通过湿化学方法和真空工艺沉积的。真空沉积法生产的薄膜质量优异，产生的有害废物很少或没有。然而，主要的缺点是在真空中批量处理的低吞吐量。本研究将寻求使用对环境无害的空气-真空-空气工艺沉积cd和CdTe薄膜。

9412919 Sampath The goal of this research is to investigate the effects of process parameters (deposition rate and ambient pressure) on the properties, grain size and electrical conductivity, of thin films. The methodology of statistical design of experiments will be applied to the development of the experimental plan and the analysis of results. Thin films are widely used in many applications, including photovoltaic devices. Thin films are deposited in industry by wet chemical methods and vacuum processes. The vacuum deposition method produces thin films of superior quality and generates little or no hazardous waste. However, the major disadvantage is the low throughput associated with batch processing in vacuum. This research will seek to deposit CdS and CdTe thin films using an air- vacuum-air process that is environmentally benign.