Upgrade an Existing 4-Target Sputtering System

美国明尼苏达大学MINT中心 亚拉巴马将购买设备升级 现有的Vac-Tec四靶溅射 系统 具体而言，提案要求 资金用于改造一台基于 控制系统和安装一个 专用残余气体分析仪。 的 设备将用于加快进度 几个研究项目，包括一个 物理、磁性和 巨磁电阻特性 用于MR的磁阻多层膜 头，和溅射FeN的性能 用于薄膜记录的基材料 头和媒体。 这两个项目 目前获得了大量的NSF资金， 个人研究者赠款的形式。 一 继续致力于这些教育和 研究生的培养证明， 13名学生参与了相关项目。 性能提高，这可能是 使用这些材料，特别是 原子工程多层膜 配置，使它们非常有吸引力 数据中的候选开发 唱片业。 常规生产 多层膜由大量 相同的双层和反应溅射的 FeN薄膜和多层膜需要高的 过程控制的程度。 此控件将 建议的升级将大大提高 加强正在进行的研究计划。

The MINT Center at the University of Alabama will purchase equipment to upgrade an existing Vac-Tec four target sputtering system. Specifically the proposal requests funds for retro-fitting a computer based control system and the installation of a dedicated residual gas analyzer. The equipment will be used to accelerate progress on several research projects, including an investigation of the physical, magnetic and magnetoresistive properties of giant magnetoresistance multilayers for use in MR heads, and of the properties of sputtered FeN based materials for both thin film recording heads and media. Both of these projects currently receive significant NSF funding in the form of individual investigator grants. A continuing commitment to these education and training of graduate students is evidenced by 13 students supported on related projects. The performance increases, which may be possible using these materials, especially in atomically engineered multilayer configurations, make them very attractive candidates for exploitation in the data recording industry. The routine production of multilayers composed of a large number of identical bilayers and of reactively sputtered FeN films and multilayers requires a high degree of process control. This control will be provided by the proposed upgrade greatly enhancing the ongoing research program.