Acquisition of a UHV Sputtering System for Superconductor Research.
Acquisition of a UHV Sputtering System for Superconductor Research.
批准号:
9214579
负责人:
Steven Anlage
金额:
$15.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1992
资助国家:
美国
项目状态:
已结题
起止时间:
1992-10-01 至 1994-09-30
中文摘要
我们预见到一个时代,在这个时代里,超导体形成了 为一个全新的高性能行业奠定基础 electronics. 这些电子前沿包括使用 约瑟夫森耦合超导体,邻近耦合 超导体/普通金属材料和超小 (正常和超导)隧道结, 对单个电子的存在敏感。 因为这些 技术的发展,我们有一个很好的机会, 研究产生的基本物理过程 他们 然而,传统的低Tc超导体( 对于所有这些应用来说是最有前途的)非常 对杂质敏感,如氧气、水蒸气和 碳污染物。 因此,有必要生产 超高真空(UHV)薄膜中的这些材料 沉积系统 我们会组装一个特高压三枪 用于制造超导体的溅射系统, 超导体/绝缘体和超导体/半导体 多层结构以及许多其他非氧化物 用于研究基础物理的超导体 固体中的过程。
英文摘要
We anticipate an era in which superconductors form the basis for a whole new industry of high performance electronics. These electronics frontiers include the use of Josephson-coupled superconductors, proximity-coupled superconductor/normal metal materials, and ultra-small (normal and superconducting) tunnel junctions which are sensitive to the presence of single electrons. As these technologies develop we have an excellent opportunity to study the fundamental physical processes which give rise to them. However, conventional low-Tc superconductors (which are most promising for all of these applications) are very sensitive to impurities, such as oxygen, water vapor and carbon contaminates. Hence it is necessary to produce these materials in ultra-high vacuum (UHV) thin film deposition systems. We will assemble a UHV, three-gun sputtering system for making superconducting, superconductor/insulator and superconductor/semiconductor multilayer structures as well as many other non-oxide superconductors for use in studying fundamental physical processes in solids.
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依托单位:
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