Small Grants for Exploratory Research (SGER): Processing Boron and Boron Carbide Thin Films for Protective Coatings and Device Fabrication

本项目将研究用硼和碳化硼材料制造微电子器件的可行性。这项研究是基于利用硼烷通过化学气相沉积的选择性区域沉积硼和碳化硼的初步成功进行的。利用X射线光刻技术将制造一系列电子器件和电子级保护涂层。碳化硼半导体器件由于其潜在的高温和抗辐射性能，可能会引起人们的极大兴趣。因此，这种设备可能会在极端条件下工作。

This project will study the feasibility of fabricating microelectronic devices from boron and boron carbide-based materials. The research is based on initial success in the selective area deposition of boron and boron carbide by chemical vapor deposition, using boranes. A number of electronic devices and electronic grade protective coatings will be fabricated by using x-ray lithographic techniques. Boron carbide-based semiconductor devices may be of considerable interest, due to their potential high temperature and radiation-resistant properties. As a result, such devices may work under extreme conditions.