REU Site for Microelectronic Materials and Processing
REU Site for Microelectronic Materials and Processing
批准号:
9300405
负责人:
Christos Takoudis
金额:
$15.0万
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1993
资助国家:
美国
项目状态:
已结题
起止时间:
1993-05-15 至 1997-04-30
中文摘要
12名学生将参加研究经验, 微电子材料与电子工程专业本科生课程 在Purdue处理。 化学、电气和 材料工程,其中已共享本科 课程以及研究电子材料和 多年来,参与这个项目。 学生将从区域大学招募, 少数民族夏季研究入学率高的大学 项目 普渡大学的本科生将能够 进行夏季或学年研究。 REU的重点 现场将合成,加工,性能,结构, 微电子材料的性能, 这些方面的相互关系。 具体项目 包括微电子膜各向异性蚀刻, 选择性外延生长和绝缘体退化、处理 在图案化的衬底上,金属接触的基础, 半导体,以及氧化膜与Si的集成 技术. REU的目标是向学生介绍- 重点是妇女和少数民族-到独立研究 在电子材料及其加工方面, 提高学生的创造力和独创性, 研究生课程的优秀候选人,以证明 成功的研究带来的兴奋和奖励,并准备 B.S.毕业生谁将在工业研究和 发展环境。
英文摘要
Twelve students will participate in the Research Experiences for Undergraduates program in microelectronic materials and processing at Purdue. The Schools of Chemical, Electrical, and Materials Engineering, which have been sharing undergraduate courses as well as research on electronic materials and processing for several years, participate in this program. Students will be recruited from regional universities and universities with high minority enrollments for summer research projects. Undergraduate students from Purdue will be able to perform summer or academic year research. The focus of the REU site will be the synthesis, processing, properties, structure, and performance of microelectronic materials, and the interrelationships among these aspects. Specific projects include anisotropic etching of microelectronic this films, selective epitaxial growth and insulator degradation, processing on patterned substrates, fundamentals of metal contacts to semiconductors, and integration of oxide films with Si technologies. The goals of the REU are to introduce students - with emphasis on women and minorities - to independent research on electronic materials and their processing, to develop and enhance the student's creativity and originality, to develop outstanding candidates for graduate programs, to demonstrate the excitement and rewards from successful research, and to prepare B.S. graduates who will excel in industrial Research and Development environments.
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REU Site in Novel Advanced Materials and Processing with Applications in Engineering
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批准号:1062943
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项目类别:Continuing Grant
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资助金额:$35.32万
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财政年份:2011
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负责人:Christos Takoudis
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依托单位:
Novel synthesis and characterization of intermediate temperature solid oxide fuel cells
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批准号:1067424
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资助金额:$47.5万
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负责人:Christos Takoudis
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依托单位:
REU Site in Novel Advanced Materials and Processing with Applications in Biomedical, Electrical and Chemical Engineering
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批准号:0755115
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项目类别:Continuing Grant
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资助金额:$32.61万
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财政年份:2008
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负责人:Christos Takoudis
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依托单位:
NIRT:Active Multiferroic Nanostructures
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批准号:0609377
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项目类别:Standard Grant
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资助金额:$0.0万
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财政年份:2006
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负责人:Christos Takoudis
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依托单位:
REU: Novel Materials and Processing in Chemical and Biomedical Engineering
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批准号:0453432
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项目类别:Continuing Grant
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资助金额:$0.0万
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财政年份:2005
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负责人:Christos Takoudis
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依托单位:
GOALI: Atomic-scale Investigation of High Dielectric Constant Thin Films Using In Situ and Other Techniques
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批准号:0329195
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项目类别:Standard Grant
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资助金额:$30.29万
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财政年份:2004
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负责人:Christos Takoudis
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依托单位:
REU Site in Novel Materials and Processing
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批准号:0139551
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项目类别:Continuing Grant
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资助金额:$19.98万
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财政年份:2002
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负责人:Christos Takoudis
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依托单位:
Raman and Infrared Spectroscopic Characterization of Catalytic Interfaces in Flow Reactor and Gas-Phas Environments
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批准号:9813984
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项目类别:Standard Grant
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资助金额:$4.58万
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财政年份:1998
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负责人:Christos Takoudis
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依托单位:
REU Site for Microelectronic Materials and Processing
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批准号:9200056
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1992
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负责人:Christos Takoudis
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依托单位:
In Situ Infrared Analysis of the Kinetics and Surface Chemistry of Reaction Processes on Silicon Subtrate Surfaces
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批准号:9106123
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项目类别:Continuing Grant
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资助金额:$12.24万
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财政年份:1991
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负责人:Christos Takoudis
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依托单位:
Silver Catalyzed Ethylene Epoxidation
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批准号:8611176
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项目类别:Standard Grant
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资助金额:$6.7万
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财政年份:1987
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负责人:Christos Takoudis
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依托单位:
Travel to Attend: International Chemical Reaction Engineer-ing Conference; Pune, India; January 9 - 11, 1984
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批准号:8320369
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项目类别:Standard Grant
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资助金额:$0.26万
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财政年份:1983
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负责人:Christos Takoudis
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