GOALI: Atomic-scale Investigation of High Dielectric Constant Thin Films Using In Situ and Other Techniques

这个目标项目包括对未来几代纳米电子技术所需的薄膜结构进行原子水平的研究。最初的重点将是硅上的氧化碲，后来扩展到更具技术意义的系统，如氮化物阻挡层上的硅酸镓。该项目将涉及在学术和工业(液化空气(AL))环境中工作的研究生，以建立生长条件、含Hf前驱体纯度、反应流体的瞬时输送方法、高介电常数结构/Si(100)界面的原子级结构特性以及高温后处理/结构/功能关系之间的关系。生长过程中的气相成分将通过独特的实时气相检测进行监控。薄膜的性质、结构和功能将通过辅助技术进行研究，如原子尺度分辨率扫描电子显微镜/电子能量损失光谱、单层灵敏度红外光谱、X射线衍射和电学表征。将用详细的物理化学模型研究高温后沉积过程中相邻元素之间的氧化和硅化所产生的固态扩散反应问题。该项目预计将对微纳电子技术和人力资源开发产生广泛影响。所涉及的学生，包括研究生和本科生，将从事不同的原子尺度的方法来生长和表征表面和界面纳米结构。研究生将定期向AL研究人员介绍他们的工作，他们还将在工业环境中提供沟通和以项目为导向的研究管理方式的经验。伊利诺伊大学芝加哥分校在向包括许多女性和代表性不足的少数族裔在内的不同学生群体提供出色的教育体验方面有着良好的记录。一个面向本科生的NSF研究体验网站也在芝加哥校区设立，重点是“新材料和新工艺”。

This GOALI project includes atomic level studies of thin film structures needed for future generations of nano-electronics technology. The initial focus will be on hafnium oxide on silicon, later extending to more technologically interesting systems such as hafnium silicates on nitride barriers. This project will involve graduate students working in an academic and industrial (Air Liquide (AL)) setting to establish the relationships among growth conditions, hafnium-containing precursor purity, method of transient delivery of reactive fluids, atomic scale structural properties of the high dielectric constant structure/Si(100) interfaces, and high-temperature post-processing/structure/function relationships. The gas phase composition during the growth process is to be monitored with unique real-time vapor phase detection. The properties, structure, and functionality of the films will be investigated with complementary techniques such as atomic scale resolution scanning transmission electron microscopy/electron energy loss spectroscopy, infrared spectroscopy with monolayer sensitivity, X-ray diffraction, and electrical characterization. The solid-state diffusion-reaction problems emerging from the oxidation and silicidation among adjacent elements during high temperature post-deposition processes will be studied with detailed physicochemical models.The project is anticipated to have a broad impact on micro- and nano-electronics technology and on the development of human resources. The involved students, both graduate and undergraduate, will engage in different atomic scale approaches to the growth and characterization of surface and interface nanostructures. Graduate students will regularly present their work to AL researchers, who will also provide experience in communication and project-oriented style of research management in an industrial setting. The University of Illinois at Chicago has a strong record of providing excellent educational experiences to a diverse body of students, including many women and under-represented minorities. An NSF Research Experiences for Undergraduates Site is also in place at the Chicago campus focused on "Novel Materials and Processing.