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GOALI: Atomic-scale Investigation of High Dielectric Constant Thin Films Using In Situ and Other Techniques

GOALI: Atomic-scale Investigation of High Dielectric Constant Thin Films Using In Situ and Other Techniques
GOALI:利用原位和其他技术对高介电常数薄膜进行原子尺度研究
批准号:
0329195
负责人:
Christos Takoudis
金额:
$30.29万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2004
资助国家:
美国
项目状态:
已结题
起止时间:
2004-01-01 至 2007-09-30

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中文摘要
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英文摘要
This GOALI project includes atomic level studies of thin film structures needed for future generations of nano-electronics technology. The initial focus will be on hafnium oxide on silicon, later extending to more technologically interesting systems such as hafnium silicates on nitride barriers. This project will involve graduate students working in an academic and industrial (Air Liquide (AL)) setting to establish the relationships among growth conditions, hafnium-containing precursor purity, method of transient delivery of reactive fluids, atomic scale structural properties of the high dielectric constant structure/Si(100) interfaces, and high-temperature post-processing/structure/function relationships. The gas phase composition during the growth process is to be monitored with unique real-time vapor phase detection. The properties, structure, and functionality of the films will be investigated with complementary techniques such as atomic scale resolution scanning transmission electron microscopy/electron energy loss spectroscopy, infrared spectroscopy with monolayer sensitivity, X-ray diffraction, and electrical characterization. The solid-state diffusion-reaction problems emerging from the oxidation and silicidation among adjacent elements during high temperature post-deposition processes will be studied with detailed physicochemical models.The project is anticipated to have a broad impact on micro- and nano-electronics technology and on the development of human resources. The involved students, both graduate and undergraduate, will engage in different atomic scale approaches to the growth and characterization of surface and interface nanostructures. Graduate students will regularly present their work to AL researchers, who will also provide experience in communication and project-oriented style of research management in an industrial setting. The University of Illinois at Chicago has a strong record of providing excellent educational experiences to a diverse body of students, including many women and under-represented minorities. An NSF Research Experiences for Undergraduates Site is also in place at the Chicago campus focused on "Novel Materials and Processing.
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Novel synthesis and characterization of intermediate temperature solid oxide fuel cells
  • 批准号:
    1067424
  • 项目类别:
    Standard Grant
  • 资助金额:
    $47.5万
  • 财政年份:
    2011
  • 负责人:
    Christos Takoudis
  • 依托单位:
REU Site in Novel Advanced Materials and Processing with Applications in Engineering
  • 批准号:
    1062943
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $35.32万
  • 财政年份:
    2011
  • 负责人:
    Christos Takoudis
  • 依托单位:
REU Site in Novel Advanced Materials and Processing with Applications in Biomedical, Electrical and Chemical Engineering
  • 批准号:
    0755115
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $32.61万
  • 财政年份:
    2008
  • 负责人:
    Christos Takoudis
  • 依托单位:
NIRT:Active Multiferroic Nanostructures
  • 批准号:
    0609377
  • 项目类别:
    Standard Grant
  • 资助金额:
    $0.0万
  • 财政年份:
    2006
  • 负责人:
    Christos Takoudis
  • 依托单位:
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