Renovation of Facilities for High Resolution Electron Beam Lithographic Patterning

圣巴巴拉的加州大学将利用该奖项对一个研究设施进行现代化改造，以便适当地容纳一台定制的高分辨率电子束写入机。 这台机器（VS 1）是由IBM捐赠给这所大学的。 它将提供一种独特的亚微米光刻工具，能够在大面积上进行配准和对准，与“制造”质量的机器相称。 机器的正常运行需要对当地环境进行精确控制：环境的温度和湿度必须保持在有限的范围内。 机器的适当隔振也是必不可少的。 VS 1的位置将与洁净室制造区域相邻，从易于接近和与整个器件/结构制造过程集成的角度来看，洁净室制造区域是最佳位置。 该奖项将使该大学能够确保该设施通过现代化VS 1运行所需的结构，电气和空气处理能力得到最佳利用。 该设施将形成一个研究工作的关键能力，已经包括100多名研究生，博士后研究员和教师在电气和计算机工程，材料，物理和化学部门。 这种“内部”能力允许形成测试结构，促进新器件概念的快速验证，但也允许技术和工艺的快速周转和调整。 ***

9313529 Hu The University of California at Santa Barbara will use this award to modernize a research facility in order to appropriately house a custom, high-resolution electron beam writing machine. The machine (VS1) was made available to this university by a donation from IBM. It will provide a unique sub-micron lithography tool capable of registration and alignment over large areas, commensurate with a "manufacturing" quality machine. The proper operation of the machine requires precise control of the local environment: temperature and humidity of the ambient must be kept within a limited range. Appropriate vibration isolation of this machine is also essential. The situation of the VS1 will be adjacent to the clean room fabrication area which is an optimal location from the point of view of easy access to and integration with the total device/structure fabrication process. This award will allow the university to ensure that this facility gets optimum use by modernizing the structural, electrical and air handling capabilities required for the operation of the VS1. This facility will form a critical capability of a research effort that already encompasses over 100 graduate students, postdoctoral fellows and faculty in the Departments of Electrical and Computer Engineering, Materials, Physics and Chemistry. This "in house" capability allows the formation of test structures that facilitate rapid prove-in of novel device concepts, but also allows rapid turn-around and adjustment of technology and processes. ***