Renovation of Facilities for High Resolution Electron Beam Lithographic Patterning

高分辨率电子束光刻图案化设备的改造

• 批准号: 9313529
• 负责人: Evelyn Hu
• 金额: $ 14.46万
• 依托单位: University of California-Santa Barbara
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-09-15 至 1994-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9313529&HistoricalAwards=false
• 关键词: Renovation; Facilities; Resolution; Electron; Beam

9313529 Hu The University of California at Santa Barbara will use this award to modernize a research facility in order to appropriately house a custom, high-resolution electron beam writing machine. The machine (VS1) was made available to this university by a donation from IBM. It will provide a unique sub-micron lithography tool capable of registration and alignment over large areas, commensurate with a "manufacturing" quality machine. The proper operation of the machine requires precise control of the local environment: temperature and humidity of the ambient must be kept within a limited range. Appropriate vibration isolation of this machine is also essential. The situation of the VS1 will be adjacent to the clean room fabrication area which is an optimal location from the point of view of easy access to and integration with the total device/structure fabrication process. This award will allow the university to ensure that this facility gets optimum use by modernizing the structural, electrical and air handling capabilities required for the operation of the VS1. This facility will form a critical capability of a research effort that already encompasses over 100 graduate students, postdoctoral fellows and faculty in the Departments of Electrical and Computer Engineering, Materials, Physics and Chemistry. This "in house" capability allows the formation of test structures that facilitate rapid prove-in of novel device concepts, but also allows rapid turn-around and adjustment of technology and processes. ***

9313529胡加州大学圣巴巴拉分校将利用这一奖项对一个研究设施进行现代化改造，以便适当地安装一台定制的高分辨率电子束写入机。这台机器(VS1)是由IBM捐赠给这所大学的。它将提供一种独特的亚微米光刻工具，能够在大范围内对准和对准，与“制造”质量的机器相称。机器的正常运行需要对当地环境进行精确控制：环境的温度和湿度必须保持在有限的范围内。这台机器的适当隔振也是至关重要的。VS1的位置将毗邻洁净室制造区域，从易于接近和与整个设备/结构制造过程集成的角度来看，这是一个最佳位置。这一奖项将允许该大学通过对VS1运行所需的结构、电气和空气处理能力进行现代化改造，确保该设施得到最佳利用。这一设施将形成一项研究工作的关键能力，这项研究工作已经包括100多名研究生、博士后研究员和电气和计算机工程、材料、物理和化学系的教职员工。这种“内部”能力允许形成测试结构，以促进新设备概念的快速验证，但也允许技术和工艺的快速周转和调整。***