NSF Young Investigator

NSF 青年研究员

• 批准号: 9358108
• 负责人: Suzanne Rohde
• 金额: $ 38.28万
• 依托单位: University of Nebraska-Lincoln
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-07-01 至 2000-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9358108&HistoricalAwards=false
• 关键词: NSF; Young; Investigator

An NYI award will support research on the deposition and properties of thin films for tribological applications. Ion enhanced physical vapor deposition using unbalanced magnetrons to improve plasma confinement will be used to deposit hard coatings, such as various metal nitride, carbide and oxide compositions, as well as superlattice and nanophase materials. Deposition mechanisms will be studied and the mechanical, tribological and other relevant properties of the coatings will be evaluated and related to microstructure and processing parameters.

NYI奖将支持对摩擦学应用的薄膜沉积和性能的研究。离子增强物理气相沉积使用不平衡磁控管来改善等离子体约束，将用于沉积硬涂层，如各种金属氮化物，碳化物和氧化物成分，以及超晶格和纳米相材料。将研究沉积机理，并评估涂层的力学、摩擦学和其他相关性能，并将其与微观结构和加工参数联系起来。