Development of Application Specific Wear-Resistant Tribological Coatings through Finite Element Analysis and Ultra-High Rate Reactive Sputtering

通过有限元分析和超高速率反应溅射开发特定用途的耐磨摩擦涂层

基本信息

  • 批准号:
    9978789
  • 负责人:
  • 金额:
    $ 14.44万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    1999
  • 资助国家:
    美国
  • 起止时间:
    1999-09-01 至 2002-08-31
  • 项目状态:
    已结题

项目摘要

9978789RohdeThe goal of this project is to develop a design methodology for selection and processing of application specific wear resistant coatings. Finite element modeling of the contact mechanics of nano-structured multi-layer films on compliant substrates will be used in combination with experimental studies to develop specific control techniques. These will allow deposition of strongly adherent hard coatings with properties that are specific to selected applications. The control techniques will be based on the physical quantities that control coating chemistry and microstructure, such as ion and atom fluxes and substrate temperature, combined with real-time in situ process monitoring and coating analysis. Initial work will focus on CrN based multi-layers for hard chrome replacement. Later, ternary transition metal nitrides and tailored multi-layer and graded-layer nano-structured coatings will be studied.***
9978789rohde该项目的目标是开发一种选择和加工特定应用的耐磨涂层的设计方法。柔性衬底上纳米结构多层薄膜接触力学的有限元建模将与实验研究相结合,以开发特定的控制技术。这将允许沉积具有特定应用特性的强附着力硬涂层。控制技术将基于控制涂层化学和微观结构的物理量,如离子和原子通量以及衬底温度,并结合实时现场过程监测和涂层分析。最初的工作将集中在基于CrN的多层硬铬替代品上。随后,将研究三元过渡金属氮化物和定制多层和级配层纳米结构涂层

项目成果

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Suzanne Rohde其他文献

Suzanne Rohde的其他文献

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{{ truncateString('Suzanne Rohde', 18)}}的其他基金

Thin Film Growth and Surface Modification through High Powered Pulsed Magnetron Sputtering
通过高功率脉冲磁控溅射进行薄膜生长和表面改性
  • 批准号:
    0953057
  • 财政年份:
    2008
  • 资助金额:
    $ 14.44万
  • 项目类别:
    Standard Grant
Thin Film Growth and Surface Modification through High Powered Pulsed Magnetron Sputtering
通过高功率脉冲磁控溅射进行薄膜生长和表面改性
  • 批准号:
    0727818
  • 财政年份:
    2007
  • 资助金额:
    $ 14.44万
  • 项目类别:
    Standard Grant
SBIR Phase I: Optimization of Cathode Sources for High Power Impulse Magnetron Sputtering
SBIR 第一阶段:高功率脉冲磁控溅射阴极源的优化
  • 批准号:
    0637600
  • 财政年份:
    2007
  • 资助金额:
    $ 14.44万
  • 项目类别:
    Standard Grant
Utilization of High Powered Pulsed Magnetron Sputtering in the Formation of Engineered Films and Surfaces
利用高功率脉冲磁控溅射形成工程薄膜和表面
  • 批准号:
    0409728
  • 财政年份:
    2004
  • 资助金额:
    $ 14.44万
  • 项目类别:
    Standard Grant
NSF Young Investigator
NSF 青年研究员
  • 批准号:
    9358108
  • 财政年份:
    1993
  • 资助金额:
    $ 14.44万
  • 项目类别:
    Continuing Grant

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