Polishing of Polycrystalline Diamond Films

多晶金刚石薄膜的抛光

• 批准号: 9361367
• 负责人: David Oakes
• 金额: $ 6.5万
• 依托单位: Physical Sciences Inc
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-01-01 至 1994-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9361367&HistoricalAwards=false
• 关键词: Polishing; Polycrystalline; Diamond; Films

9361367 Oakes An innovative technique for the polishing of polycrystalline diamond films is described which uses a high flux, high translational energy (5 to 10 volt) atomic oxygen beam at glancing incidence to etch surface roughness. The method operates in a reactive etchant energy range, at high flux, that is not obtained by any other chemical or physical method. As a result, the technique is capable of high polishing rates (0.2 micrometers/min) at low substrate temperatures. In addition, it is non intrusive and is intrinsically scalable for large area (1000 cm2) polishing. In a collaborative effort with industry, efficient, high rate diamond etching with a significant degree of surface finishing has been demonstrated. Existing polishing techniques suffer from one or more of the following deficiencies: slow polishing rate, small polishing areas, high substrate temperatures during polishing, the need to aggressively handle the diamond film or substrate, and the potential for defect and impurity incorporation into the diamond film resulting from interaction with energetic ions. The proposed technique is capable of overcoming all of these deficiencies. Due to diamonds superlative properties the potential commercial applications of diamond films are extensive. In particular, polished polycrystalline films have optical and tribological applications. Application of diamond as a heat sink will also benefit from this technique.

9361367描述了一种用于抛光多晶金刚石薄膜的创新技术，该技术使用高通量、高平移能量(5至10伏)的原子氧束在掠入射下蚀刻表面粗糙度。该方法在高通量的反应蚀刻剂能量范围内工作，这是任何其他化学或物理方法所不能获得的。因此，该技术能够在低衬底温度下实现高抛光速率(0.2微米/分钟)。此外，它是非侵入性的，本质上是可伸缩的，可用于大面积(1000 Cm2)抛光。在与业界的合作中，高效、高速率的钻石蚀刻已经被证明具有显著的表面精加工程度。现有的抛光技术存在以下一个或多个缺陷：抛光速度慢、抛光面积小、抛光过程中衬底温度高、需要积极处理金刚石膜或衬底、以及由于与高能离子的相互作用而可能导致缺陷和杂质进入金刚石膜。所提出的技术能够克服所有这些缺陷。由于金刚石具有优异的性能，金刚石薄膜具有广泛的商业应用潜力。特别是，抛光的多晶膜具有光学和摩擦学应用。钻石作为热沉的应用也将从这项技术中受益。