Low Temperature Diamond Film Coating Technique

许多基材不适合金刚石涂层， 正确的处理技术需要在更高的温度下操作， 压力和温度，这可能是有害的， 衬底 该项目将利用一种独特的脉冲快原子 在低温下开发金刚石涂层 温度 快速束流可以提供高浓度的C 和H原子的比例与PCVD工艺中使用的比例相同，但 非常高的速度。 在撞击时，高速，短 持续时间（> 30秒）的光束将能量传递到表面， 将微层加热至高温和/或使得能够 金刚石膜生长的化学障碍有待克服。 这 该方法避免了对体衬底加热的要求。 的 第一阶段的工作将针对实验室演示 将我们的快速光束技术用于钻石的潜力 低温基材的涂层。 圆满完成 第一阶段的努力将允许利用金刚石薄膜 在先进的基板上，这将受到不利影响， 现存金刚石涂层的环境条件 流程.

Many substrates are not amenable to diamond coating because the correct processing technologies require operation at elevated pressures and temperatures which can be deleterious to the substrate. This project will utilize a unique pulsed fast atom source to develop diamond coatings on substrates held at low temperatures. The fast beam can provide high concentrations of C and H atoms in the same ratio as utilized in PCVD processes but at very high velocities. Upon impact the high velocity, short duration (> 30 >s) beam will transfer energy to the surface, heating a microlayer to elevated temperatures and/or enabling chemical barriers to diamond film growth to be surmounted. This approach avoids the requirements of bulk substrate heating. The Phase I effort will be directed towards a laboratory demonstration for the potential of using our fast beam technology for diamond coating of low temperature substrates. The successful completion of the Phase I effort will allow the utilization of diamond films on advanced substrates which would be affected adversely by the environmental conditions required in extant diamond coating processes.