Low Temperature Diamond Film Coating Technique

许多衬底不适合金刚石涂层，因为正确的处理技术需要在较高的压力和温度下运行，这可能对衬底有害。该项目将利用一种独特的脉冲快原子源在低温下保持的衬底上开发金刚石涂层。快束能以与PCVD工艺相同的比例提供高浓度的C和H原子，但速度非常快。在撞击时，高速、持续时间短的光束(&gt；30&gt；S)将能量转移到表面，将微层加热到更高的温度和/或使金刚石薄膜生长的化学障碍得以克服。这种方法避免了对衬底整体加热的要求。第一阶段的工作将针对使用我们的快速光束技术在低温衬底上进行金刚石涂层的潜力进行实验室演示。第一阶段工作的成功完成将使先进衬底上的金刚石薄膜得以使用，这将受到现有金刚石涂层工艺所要求的环境条件的不利影响。

Many substrates are not amenable to diamond coating because the correct processing technologies require operation at elevated pressures and temperatures which can be deleterious to the substrate. This project will utilize a unique pulsed fast atom source to develop diamond coatings on substrates held at low temperatures. The fast beam can provide high concentrations of C and H atoms in the same ratio as utilized in PCVD processes but at very high velocities. Upon impact the high velocity, short duration (> 30 >s) beam will transfer energy to the surface, heating a microlayer to elevated temperatures and/or enabling chemical barriers to diamond film growth to be surmounted. This approach avoids the requirements of bulk substrate heating. The Phase I effort will be directed towards a laboratory demonstration for the potential of using our fast beam technology for diamond coating of low temperature substrates. The successful completion of the Phase I effort will allow the utilization of diamond films on advanced substrates which would be affected adversely by the environmental conditions required in extant diamond coating processes.