Chemically Amplified Positive (CAMP) Resists for Waveguide Applications

用于波导应用的化学放大正性 (CAMP) 光刻胶

• 批准号: 9361545
• 负责人: Jim Meador
• 金额: $ 6.5万
• 依托单位: Brewer Science, Inc.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1994
• 资助国家: 美国
• 起止时间: 1994-03-01 至 1994-11-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9361545&HistoricalAwards=false
• 关键词: Chemically; Amplified; Positive; CAMP; Resists

9361545 Meador Waveguides are used to transmit light through optical processors. Combining the resolution potential of deep-UV photolithography and the extreme sensitivity/high contrast of chemically amplified positive acting (CAMP) resists offers a potentially simple method for fabricating highly resolved, polymeric waveguides structures. CAMP resists can be mated with other cladding materials with lower refractive indices to provide the necessary gradient. The objectives of this program (Phases I and II) are to optimize CAMP resists for waveguide applications, to directly fabricate structure using deep-UV exposure, and to characterize the structure's performance. CAMP resists (thin film) are noted for outstanding sensitivity, contrast, and resolution; but thick film performance is not well documented. For the Phase I effort, we will synthesize two acid- sensitive polymers {poly(p-t-butoxycarbonyloxystyrene) and poly(p- t-butoxycarbonyloxystyrene-sulfone)} and two photoacid generators (2,6-dinitrobenzyl tosylate and triphenylsulfonium triflate). The polymers and photoacid generators will be chemically characterized; and formulated resists will be tested for thick film application performance, deep-UV sensitivity, contrast, resolution, near infrared absorption, and refractive index. Resist(s) will be micromachined into waveguides and at least one structure characterized (optical loss, SEM, refractive index). The resist materials and waveguide fabrication procedures developed in Phase I will be further improved in Phase II and preferred light guiding structures characterized. ***

9361545 Meador波导用于通过光学处理器传输光。 结合深紫外光刻的分辨率潜力和化学放大正性作用（CAMP）抗蚀剂的极端灵敏度/高对比度，提供了一种用于制造高分辨率聚合物波导结构的潜在简单方法。 CAMP抗蚀剂可以与具有较低折射率的其他包层材料配合以提供必要的梯度。 该计划（第一阶段和第二阶段）的目标是优化CAMP抗蚀剂的波导应用，直接制造结构使用深紫外曝光，并表征结构的性能。 CAMP抗蚀剂（薄膜）以出色的灵敏度，对比度和分辨率而闻名;但厚膜性能没有很好的记录。 对于阶段I的努力，我们将合成两种酸敏感聚合物{聚（对叔丁氧基羰基氧基苯乙烯）和聚（对叔丁氧基羰基氧基苯乙烯-砜）}和两种光酸产生剂（甲苯磺酸2，6-二硝基苄基酯和三氟甲磺酸三苯基锍）。 聚合物和光酸产生剂将进行化学表征;配制的抗蚀剂将进行厚膜应用性能、深紫外敏感性、对比度、分辨率、近红外吸收和折射率测试。 抗蚀剂将被微机械加工成波导和至少一个表征的结构（光学损耗、SEM、折射率）。 在第一阶段中开发的抗蚀剂材料和波导制造程序将在第二阶段中进一步改进，并表征优选的光导结构。 ***