Chemically Amplified Positive (CAMP) Resists for Waveguide Applications

9361545波导用于通过光学处理器传输光。结合深紫外光刻技术的分辨率潜力和化学放大正作用（CAMP）抗蚀剂的极高灵敏度/高对比度，为制造高分辨率聚合物波导结构提供了一种潜在的简单方法。CAMP电阻可以与其他具有较低折射率的包层材料配合使用，以提供必要的梯度。该计划（第一阶段和第二阶段）的目标是优化用于波导应用的CAMP电阻，使用深紫外曝光直接制造结构，并表征结构的性能。CAMP抗蚀剂（薄膜）以其出色的灵敏度、对比度和分辨率而闻名；但厚膜性能没有很好的记录。在第一阶段的努力中，我们将合成两种酸敏感聚合物{聚（对-t-丁氧基羰基氧苯乙烯）和聚（对-t-丁氧基羰基氧苯乙烯-砜）}和两种光酸发生器（2,6-二硝基苯甲酯和三氟酸三苯磺酸）。将对聚合物和光酸发生器进行化学表征；和配制的抗蚀剂将测试厚膜应用性能，深紫外灵敏度，对比度，分辨率，近红外吸收和折射率。电阻将被微机械加工成波导和至少一种结构特征（光学损耗，扫描电镜，折射率）。第一阶段开发的抗蚀剂材料和波导制造工艺将在第二阶段进一步改进，并优选光导结构。＊＊＊

9361545 Meador Waveguides are used to transmit light through optical processors. Combining the resolution potential of deep-UV photolithography and the extreme sensitivity/high contrast of chemically amplified positive acting (CAMP) resists offers a potentially simple method for fabricating highly resolved, polymeric waveguides structures. CAMP resists can be mated with other cladding materials with lower refractive indices to provide the necessary gradient. The objectives of this program (Phases I and II) are to optimize CAMP resists for waveguide applications, to directly fabricate structure using deep-UV exposure, and to characterize the structure's performance. CAMP resists (thin film) are noted for outstanding sensitivity, contrast, and resolution; but thick film performance is not well documented. For the Phase I effort, we will synthesize two acid- sensitive polymers {poly(p-t-butoxycarbonyloxystyrene) and poly(p- t-butoxycarbonyloxystyrene-sulfone)} and two photoacid generators (2,6-dinitrobenzyl tosylate and triphenylsulfonium triflate). The polymers and photoacid generators will be chemically characterized; and formulated resists will be tested for thick film application performance, deep-UV sensitivity, contrast, resolution, near infrared absorption, and refractive index. Resist(s) will be micromachined into waveguides and at least one structure characterized (optical loss, SEM, refractive index). The resist materials and waveguide fabrication procedures developed in Phase I will be further improved in Phase II and preferred light guiding structures characterized. ***