New Materials for Optical Wave Guides

光信号通过光处理器 波导结构的互连系统。 氟化 聚合物，由于其出色的性能， 用于制造这些结构的材料。 含氟聚合物可以与其他塑料或陶瓷配对， 更高的折射率和“潜在”制造成波 采用创新的微机械加工技术的导向结构 称为LIGA微成形。 这个项目的最终目标 （第一阶段和第二阶段）是直接制造波导 通过X射线或深紫外光刻来制造结构。 新型抗蚀剂材料具有出色的灵敏度、对比度 “厚膜”要求分辨率和附着力 微机械加工所需的涂层。 这些抵抗将是 在第一阶段计划中。 在第一阶段，我们将 合成两种有希望候选聚（三氟乙基 甲基丙烯酸酯）和聚（甲基丙烯酸六氟异丙酯），以及 评估X射线和深紫外线曝光的抗蚀剂性能。 每种氟化单体将与3-肟基-2-甲基丙烯酸酯共聚。 丁酮甲基丙烯酸酯，提高对深紫外线的敏感性 exposure. 将对这两种共聚物进行深紫外评价 性质纯净，也用对叔丁基苯甲酸敏化。 这四种聚合物将进行化学表征和测试， 应用性能，对深U和X射线的敏感性 （仅限均聚物）、对比度、分辨率和折射率 与波长的关系。 显影剂和冲洗周期将是 为每种聚合物优化。 抵抗材料和显影剂从 第一阶段将在第二阶段进一步优化， 微机械加工波导。

Light signals pass through optical processors via an interconnecting system of wave guide structures. Fluorinated polymers, because of their outstanding properties, are logical materials for use in fabricating these structures. Fluoropolymers can be paired with other plastics of ceramics of higher refractive index and "potentially" fabricated into wave guide structures using an innovative micromachining technique known as LIGA Microforming. The ultimate goal of this program (Phase I and II) is the direct fabrication of wave guide structures by X-ray or deep UV lithography. New resist materials with outstanding sensitivity, contrast, resolution, and adhesion are required for the "Thick film" coatings necessary for micromachining. These resists will be designed in the Phase I program. For the Phase I effort, we will synthesize two promising candidates poly (trifluoroethyl methacrylate) and poly (hexafluoroisopropyl methacrylate) and evaluate resist performance for both X-ray and deep UV exposure. Each fluorinated monomer will be copolymerized with 3-oximino-2 butanone methacrylate to give improved sensitivity for deep-UV exposure. The two copolymers will be evaluated for deep-UV properties neat and also sensitized with p-t-butylbenzoic acid. The four polymers will be chemically characterized and tested for application properties, sensitivity to deep-U and X-ray (homopolymers only), contrast, resolution, and refractive index versus wavelength. The developer and rinse cycle will be optimized for each polymer. Resist materials and developers from Phase I will be further optimized in Phase II and used for micromachining a wave guide.