New Materials for Optical Wave Guides

光波导新材料

• 批准号: 9160537
• 负责人: Jim Meador
• 金额: $ 5万
• 依托单位: Brewer Science, Inc.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1992
• 资助国家: 美国
• 起止时间: 1992-01-15 至 1992-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9160537&HistoricalAwards=false
• 关键词: New; Materials; Optical; Wave; Guides

Light signals pass through optical processors via an interconnecting system of wave guide structures. Fluorinated polymers, because of their outstanding properties, are logical materials for use in fabricating these structures. Fluoropolymers can be paired with other plastics of ceramics of higher refractive index and "potentially" fabricated into wave guide structures using an innovative micromachining technique known as LIGA Microforming. The ultimate goal of this program (Phase I and II) is the direct fabrication of wave guide structures by X-ray or deep UV lithography. New resist materials with outstanding sensitivity, contrast, resolution, and adhesion are required for the "Thick film" coatings necessary for micromachining. These resists will be designed in the Phase I program. For the Phase I effort, we will synthesize two promising candidates poly (trifluoroethyl methacrylate) and poly (hexafluoroisopropyl methacrylate) and evaluate resist performance for both X-ray and deep UV exposure. Each fluorinated monomer will be copolymerized with 3-oximino-2 butanone methacrylate to give improved sensitivity for deep-UV exposure. The two copolymers will be evaluated for deep-UV properties neat and also sensitized with p-t-butylbenzoic acid. The four polymers will be chemically characterized and tested for application properties, sensitivity to deep-U and X-ray (homopolymers only), contrast, resolution, and refractive index versus wavelength. The developer and rinse cycle will be optimized for each polymer. Resist materials and developers from Phase I will be further optimized in Phase II and used for micromachining a wave guide.

光信号通过波导结构的互连系统通过光处理器。氟化聚合物由于其优异的性能，是用于制造这些结构的合理材料。含氟聚合物可以与其他具有更高折射率的陶瓷塑料配对，并“潜在地”使用一种被称为LIGA微成形的创新微加工技术制成波导结构。这个项目（第一阶段和第二阶段）的最终目标是通过x射线或深紫外光刻直接制造波导结构。微加工所需的“厚膜”涂层需要具有出色灵敏度、对比度、分辨率和附着力的新型抗蚀剂材料。这些抗蚀剂将在第一阶段项目中进行设计。对于第一阶段的努力，我们将合成两种有希望的候选聚（三氟乙基甲基丙烯酸酯）和聚（六氟异丙基甲基丙烯酸酯），并评估x射线和深紫外曝光的抗蚀性能。每个氟化单体将与3-肟胺-2丁酮甲基丙烯酸酯共聚，以提高深紫外曝光的灵敏度。这两种共聚物将被评价为纯深紫外性能，并与对丁基苯甲酸敏化。将对这四种聚合物进行化学表征，并测试其应用性能、对深u和x射线的敏感性（仅限均聚物）、对比度、分辨率和波长折射率。显影剂和冲洗周期将针对每种聚合物进行优化。第一阶段的抗蚀剂材料和开发人员将在第二阶段进一步优化，并用于波导的微加工。