Engineering Research Equipment: Mass Spectrometer for Chemical Vapor Deposition Kinetic Studies

主要研究者（PI）计划组装一个四重质谱仪，以协助化学气相沉积（CVD）过程的机理研究。 光谱仪的真空系统应包括两级差动泵送，以允许在反应条件下对CVD系统中的气相物质进行原位取样。 该系统将组装成一个便携式单元，具有可调节的样品探针方向，以便灵活地使用不同CVD反应器配置和多个用户的系统。 该设备的一个应用将是协助PI目前对铜薄膜CVD反应机理、动力学参数和反应器设计模型的研究。 该设备也将适用于一系列其他项目，无论是在PI的实验室（例如使用醇盐热解的TiO2 CVD），还是其他研究气固反应动力学的研究人员（例如甲烷氧化研究）。

The Principal Investigator (PI) plans to assemble a quadruple mass spectrometer for assisting with mechanistic studies of chemical vapor deposition (CVD) processes. The vacuum system for the spectrometer is to include two stages of differential pumping to allow in-situ sampling of gas phase species from CVD systems under reaction conditions. The system will be assembled as a portable unit with an adjustable sample probe orientation in order to allow flexibility for using the system with different CVD reactor configurations and multiple users. One application for the equipment will be to assist with the PI's current research into the reaction mechanism, kinetic parameters, and reactor design models for the CVD of copper thin films. The equipment will also be suitable for a range of other projects, both in the PI's laboratory (e.g. TiO2 CVD using alkoxide pyrolysis) as well as other investigators who are studying gas-solid reaction kinetics (e.g. methane oxidation research).