NSF-CGP Science Fellowship Program: Process and Device Modeling Research
NSF-CGP Science Fellowship Program: Process and Device Modeling Research
批准号:
9414661
负责人:
Scott Dunham
金额:
$2.78万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-01-01 至 1995-12-31
中文摘要
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英文摘要
9414661 Dunham This proposal supports the collaboration of Dr. Scott Dunham of Boston University and Dr. Kenji Taniguchi from Osaka University in Osaka, Japan. Project funding will enable Dr. Dunham to spend six months in Japan, resident at Osaka University, in order to conduct research on process and device modeling with Dr. Taniguchi and other Japanese electrical engineers. This project comprises two major goals. The first goal is to gain a greater understanding of process and device modeling research in Japan, as well as current and expected future directions in VLSI technology that will have a direct impact on future modeling needs. The second goal is to develop collaborative research with Japanese workers, at both Osaka University as well as at industrial research laboratories. This proposal brings together research scientists from two countries working in the area of technology computer-aided design. The U.S. scientist will have the opportunity to become familiar with research techniques and equipment at Osaka University and private sector Japanese laboratories. Therefore, this proposal fulfills the objectives of the Program in its exchange and transfer of scientific knowledge through an international collaboration. ***
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
RIA: Modeling Redistribution of Substitutional Impurities in Heavily-Doped Silicon
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批准号:9009591
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项目类别:Standard Grant
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资助金额:$6.0万
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财政年份:1990
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负责人:Scott Dunham
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依托单位:
国内基金
海外基金
棉花色素腺体相关CRISPR突变体库的构建及CGP基因调控腺体发育和功能的分子机制
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批准号:32172041
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项目类别:面上项目
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资助金额:58万元
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批准年份:2021
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负责人:高巍
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依托单位:
cGP/IGF-1 调控 T2DM 发生发展机制的研究
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批准号:
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项目类别:省市级项目
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资助金额:3.0万元
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批准年份:2019
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负责人:
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依托单位:--