Scaleup of the 'Electron Jet' Jet Vapor Deposition Source

“Electron Jet”喷射气相沉积源的放大

• 批准号: 9460604
• 负责人: Bret Halpern
• 金额: $ 6.5万
• 依托单位: Jet Process Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1995
• 资助国家: 美国
• 起止时间: 1995-02-01 至 1995-11-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9460604&HistoricalAwards=false
• 关键词: Scaleup; Electron; Jet; Vapor; Deposition

This Small Business Innovation Research Phase I project aims to lay the foundation for scaleup and commercial application of a powerful new thin film Jet Vapor Deposition (JVD) source, the `electron jet, or e-jet`, recently invented at Jet Process Corporation (JPC). JVD is gaining increased recognition for its use of `sonic jets in low vacuum` to deposit high quality films of metals, semiconductors, oxides, nitrides, and organics at high rate. The e-jet has the potential to combine very high rates of deposition with very precise in-situ control of the properties of the growing film. This is done by high flux ion bombardment with low energy ions, a capability made possible by the unusually high ion density of the e-jet's plasma. JPC is collaborating with several large companies on applications where the e-jet offers the only promising, commercially viable solution. In order to realize the e-jet's promise of ultra-high throughput and fine property control they propose to investigate and optimize e-jet performance factors critical to film quality: cluster formation and growth, plasma ion density, and ion impact energy on biased substrates. In Phase I JPC will use mass spectrometry, Langmuir probe methods, and retarding potential techniques to address those issues. Success in Phase I will result in a JVD source capable of extremely high throughputs, control of film quality, pollution free operation, and application to many materials; in Phase II a tenfold faster e-jet will be constructed for commercial applications. Enhancement of e-jet performance will lead to immediate economic benefits for JPC and its contractors in a wide range of applications.

这个小企业创新研究第一阶段项目的目的是为一个强大的新的薄膜喷射气相沉积（JVD）源，“电子喷射，或e-jet”，最近在喷气工艺公司（JPC）发明的规模和商业应用奠定基础。JVD因其使用“低真空中的音速喷射”以高速率存款高质量的金属、半导体、氧化物、氮化物和有机物薄膜而获得越来越多的认可。电子喷射具有将非常高的沉积速率与生长膜的性质的非常精确的原位控制相结合的联合收割机的潜力。这是通过用低能离子进行高通量离子轰击来实现的，这种能力是由电子喷射等离子体的异常高的离子密度实现的。JPC正在与几家大公司合作，在这些应用中，电子喷气机提供了唯一有前途的商业可行的解决方案。为了实现电子喷射的超高吞吐量和精细性能控制的承诺，他们建议研究和优化对薄膜质量至关重要的电子喷射性能因素：团簇形成和生长，等离子体离子密度和离子对偏置衬底的冲击能量。在第一阶段，JPC将使用质谱法、朗缪尔探针法和阻滞电位技术来解决这些问题。第一阶段的成功将导致JVD源能够极高的吞吐量，薄膜质量控制，无污染操作，并应用于许多材料;在第二阶段，将建造一个速度快十倍的电子喷射器用于商业应用。电动喷射机性能的提高将为JPC及其承包商在广泛的应用中带来直接的经济效益。