Photobleachable Host-Guest Thin for Integrated Optical Devices

用于集成光学器件的光漂白主客体薄层

• 批准号: 9303207
• 负责人: Bret Halpern
• 金额: $ 30万
• 依托单位: Jet Process Corporation
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1993
• 资助国家: 美国
• 起止时间: 1993-09-15 至 1996-02-29
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9303207&HistoricalAwards=false
• 关键词: Photobleachable; Host; Guest; Thin; Integrated

Thin film passive waveguide are key elements of integrated optical circuits. If the benefits of optical fiber communication are to widely available, thin film waveguides must be manufactured rapidly, reliably and cheaply. This cannot be done now. In Phase I we used our proprietary, environmentally sound Jet Vapor Deposition (JVD) process to make an unusual starting material: a ceramic host film doped with an organic dye guest; this was then photo- patterned, producing a working thin film waveguide. JVD followed by photo-patterning has the potential for high throughput, inexpensive production. JVD ceramic-organic host-guest films, produced at high rate, in unlimited variety, and at room temperature, have excellent optical, chemical and mechanical properties for integrated optics. Accordingly, the JVD + photo-patterning strategy can i) provide a new class of materials useful for integrated optics and compatible with electronic ICs and ii) open the way to high volume manufacture of integrated optic circuits. In Phase II we will investigate the optical properties of JVD dye- doped ceramic films, fabricate devices from them, e.g., directional couplers and filters, demonstrate JVD linking of an optical fiber to a thin film waveguide, and implement laser photo-patterning . Our Phase II research will provide both fundamental advances in photonic materials and new approaches to integrated optics manufacturing. **

薄膜无源波导是光波导的关键元件， 集成光学电路 的好处是否 光纤通信将广泛 可用，薄膜波导必须 快速、可靠和廉价地制造。 这 现在不能做。 在第一阶段，我们使用 专有、环保的Jet Vapor 沉积（JVD）工艺， 起始材料：掺杂有以下物质的陶瓷主体膜 一种有机染料客人;这是当时的照片- 图案化，产生工作薄膜， 波导管 JVD之后进行光图案化 具有高通量的潜力， 廉价的生产。 JVD有机陶瓷 主宾电影，生产率高，在 在室温下， 优异的光学、化学和机械性能 用于集成光学的特性。 因此 JVD +光图案化策略可以i）提供 用于集成光学的新型材料 与电子IC兼容，以及ii）开放 大批量生产的途径 集成光学电路 在第二阶段，我们将 研究JVD染料的光学性质- 掺杂陶瓷薄膜，用它们制造器件， 例如，在一个实施例中，定向耦合器和滤波器，演示 光纤与薄膜的JVD连接 波导，并实现激光光刻 . 我们的第二阶段研究将提供 光子材料的基本进展， 集成光学新方法 制造业 **