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Engineering Research Equipment: Equipment for High Lateral Resolution Lithography

Engineering Research Equipment: Equipment for High Lateral Resolution Lithography
工程研究设备: 高横向分辨率光刻设备
批准号:
9500019
负责人:
David Trumper
金额:
$8.6万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-04-15 至 1997-09-30

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中文摘要
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英文摘要
9500019 Trumper This engineering research equipment award will be used to build a unique high lateral resolution positioning system: 1.0 nm repeatability in a 25mm x 25 mm x 100 micrometer space. This system forms the basis for what is termed the long-range scanning stage (LORS), a critical component in the next generation of equipment used to manufacture integrated circuits, photo-masks, and micromechanical actuators. The basic components funded by this award are a scanned probe microscope comprised of a system controller and a sample stage for scanning transmission or atomic force microscopy, a laser interferometry system, and a high speed data acquisition and digital signal processing system. The design is based on the investigator's expertise in hybrid oil/magnetic bearings that achieve a mechanical noise level of 0.4 nm peak-to-peak. This precision mechanical positioning device is a new concept, that will form the basis for new types of ultra precision manufacturing equipment needed to produce high value precision or micromechanical products, and photo-masks for integrated circuits. ***
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Research on Quantum Field Theory without a Lagrangian Description
  • 批准号:
    24ZR1403900
  • 项目类别:
    省市级项目
  • 资助金额:
    --
  • 批准年份:
    2024
  • 负责人:
    SATOSHI NAWATA
  • 依托单位:
Cell Research
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