CAREER: Effects of Chemical Composition and Processing Conditions on Microstructure Evolution and Electromigation Resistance in Metallic Thin Films

职业：化学成分和加工条件对金属薄膜微观结构演变和抗电腐蚀的影响

• 批准号: 9501111
• 负责人: Dimitrios Maroudas
• 金额: $ 22.99万
• 依托单位: University of California-Santa Barbara
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1995
• 资助国家: 美国
• 起止时间: 1995-07-01 至 1999-06-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9501111&HistoricalAwards=false
• 关键词: CAREER; Effects; Chemical; Composition; Processing

9501111 Maroudas This is a CAREER program with emphasis on both research and teaching in the area concerned with the reliability of metallic thin films used in device interconnections in integrated circuits. The research aspects of the program address the effects of thin-film chemical composition on the evolution of the microstructure and the propagation of damage in the metallic conductor under electric thermal and stress fields involved during thin-film processing and circuit operation. The program involves atomic-scale modeling to predict surface and interfacial thin-film properties and analysis of compositional effects on grain-structure evolution, the dynamics of precipitate formation and void propagation. The educational aspect of the program relies on computational materials science to offer the necessary tools to model the experimental observations and to introduce the results of these studies into graduate-level courses. ***

9501111 Maroudas这是一个职业计划，重点是研究和教学在集成电路中用于器件互连的金属薄膜的可靠性。该方案的研究方面涉及薄膜加工和电路运行过程中涉及的电热和应力场下，薄膜化学成分对金属导体微观结构演变和损伤传播的影响。该计划包括原子尺度建模，以预测表面和界面薄膜性能，并分析成分对晶粒结构演变的影响，沉淀形成和空洞扩展的动力学。该计划的教育方面依赖于计算材料科学，提供必要的工具来模拟实验观察，并将这些研究的结果引入研究生水平的课程。＊＊＊