Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing I (Symposium to be held in Reno, NE, May 2l-26, l995)
Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing I (Symposium to be held in Reno, NE, May 2l-26, l995)
批准号:
9521742
负责人:
M. Meyyappan
金额:
$0.4万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1995
资助国家:
美国
项目状态:
已结题
起止时间:
1995-04-01 至 1996-03-31
中文摘要
9521742 Meyappan提供的资金将用于资助研究生参加第一届半导体制造过程控制、诊断和建模研讨会的旅费,该研讨会致力于微电子制造领域的最新发展。***
英文摘要
9521742 Meyyappan The funds provided will be used to support travel costs incurred by graduate students attending the First Symposium on Process Control, Diagnostics and Modeling in Semiconductor Manufacturing, a symposium dedicated to recent developments in the field of micoelectronic manufacturing. ***
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
A Noninvasive Temperature Sensor for Plasma Processing of Semiconductors
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批准号:9260650
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项目类别:Standard Grant
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资助金额:$5.0万
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财政年份:1993
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负责人:M. Meyyappan
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依托单位:
Ultra Fast Time Resolved Spectrofluorometer
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批准号:9260066
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项目类别:Standard Grant
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资助金额:$4.95万
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财政年份:1993
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负责人:M. Meyyappan
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依托单位:
A Non-Invasive Sensor Technique for Process Control in Plasma Processing Reactors
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批准号:9161456
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项目类别:Standard Grant
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资助金额:$4.99万
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财政年份:1992
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负责人:M. Meyyappan
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依托单位:
国内基金
海外基金
Cortical control of internal state in the insular cortex-claustrum region
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批准号:--
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项目类别:--
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资助金额:25万元
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批准年份:2020
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负责人:Robert Konrad Naumann
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依托单位: