Microtexture Analysis System Using Electron Backscatter Patterns

使用电子背散射图案的微观结构分析系统

• 批准号: 9523050
• 负责人: George Johnson
• 金额: $ 12.55万
• 依托单位: University of California-Berkeley
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1995
• 资助国家: 美国
• 起止时间: 1995-09-01 至 1999-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9523050&HistoricalAwards=false
• 关键词: Microtexture; Analysis; System; Using; Electron

9523050 Johnson This Academic Research Infrastructure (Development) Award is made to partially fund the development of a Microstructure Analysis System using electron backscatter patterns (EBSP). The new EBSP system will be used for research in a variety of areas such as fracture initiation, recrystallization and polyphase deformations. This system will permit the complete determination of both the microstructure and local grain the complete determination of both the microstructure and local grain orientations of polycrystalline materials with a resolution on the order of microns. The basis of the EBSP technique is to focus a narrow beam of electrons on a very small sample of the material and probe this region to produce a pattern of light and dark bands known as the Kikuchi pattern. The pattern can be identified and attributed to lattice plans in the material. From this identification, the local crystal orientation is determined. ***

该学术研究基础设施（发展）奖用于部分资助使用电子背散射模式（EBSP）的微观结构分析系统的开发。新的EBSP系统将用于各种领域的研究，如裂缝萌生、再结晶和多相变形。该系统将允许以微米级的分辨率完全确定多晶材料的微观结构和局部晶粒取向。EBSP技术的基础是将一束狭窄的电子束聚焦在一个非常小的材料样本上，并探测该区域，以产生一种被称为菊池模式的明暗带模式。这种图案可以被识别并归因于材料中的晶格图。通过这种识别，确定了局部晶体的取向。＊＊＊