Development of a Laboratory for Ultra High Resolution Electron Beam Nanofabrication and Imaging Research in Electrical Engineering and Physics

电气工程和物理领域超高分辨率电子束纳米加工和成像研究实验室的发展

• 批准号: 9601738
• 负责人: Axel Scherer
• 金额: $ 20万
• 依托单位: California Institute of Technology
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-09-01 至 1998-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9601738&HistoricalAwards=false
• 关键词: Development; Laboratory; Ultra; Resolution; Electron

9601738 Scherer There is continuing effort to develop new techniques to reduce the lateral sizes of nanostructures. As the design of electron microscopes has improved, and the anisotropy of the pattern transfer processes is optimized, it is now becoming possible to fabricate structures below 10 nm. In this size regime fundamentally new types of device behavior are expected to occur. The exceptional sensitivity to size in this domain, in which structures are only tens of atoms across, means that even small improvements (e.g., factor of two) in the resolution and dimensional control of lithography and pattern transfer can have profound impact upon our ability to resolve new phenomena. In addition, the behavior of more conventional devices, such as semiconductor lasers, can be improved and controlled by high resolution lithography. Herein, the authors propose that low voltage electron beam lithography carried out by means of a field-emission electron microscope can provide such control. Funding is solicited to establish a laboratory of ultra high resolution electron beam (e-beam) nanofabrication and imaging. This laboratory will enable the development of new techniques for e-beam lithography at very low electron acceleration voltages, and will permit the fabrication of structures in the size regime approaching the molecular scale. It will serve to complement NSF's national laboratories for nanofabrication; its smaller size (a core group of two professors who have collaborated on nanostructures for a decade) is conducive to the pursuit of developmental work in electron beam lithography- sustained, rather specialized work that would be less facile in the larger user facilities. In addition, this collaboration brings together a unique combination of expertise and equipment that is essential for these endeavors. ***

谢勒继续努力开发新技术以减小纳米结构的横向尺寸。 随着电子显微镜设计的改进，以及图案转移工艺的各向异性的优化，现在可以制造10 nm以下的结构。 在这种尺寸范围内，预计将出现全新类型的器件行为。 在这个结构只有几十个原子的领域中，对尺寸的特殊敏感性意味着即使是很小的改进（例如，在光刻和图案转移的分辨率和尺寸控制中的两个因素）可以对我们解决新现象的能力具有深远的影响。 此外，更传统的设备，如半导体激光器的行为，可以通过高分辨率光刻来改善和控制。 在此，作者提出，通过场发射电子显微镜进行的低电压电子束光刻可以提供这样的控制。 寻求资金建立一个超高分辨率电子束（电子束）纳米加工和成像实验室。 该实验室将能够在非常低的电子加速电压下开发电子束光刻的新技术，并将允许在接近分子尺度的尺寸范围内制造结构。 它将补充美国国家科学基金会的国家实验室的纳米结构;其较小的规模（一个核心小组的两名教授谁已经合作了十年的纳米结构）是有利于追求发展工作的电子束光刻-持续的，而专业的工作，将不那么容易在较大的用户设施。 此外，这种合作汇集了对这些努力至关重要的专业知识和设备的独特组合。 ***