National Science Foundation Research Equipment Grant Program: TiNi Sputtering System

国家科学基金会研究设备资助计划：TiNi 溅射系统

• 批准号: 9622283
• 负责人: Greg Carman
• 金额: $ 5.5万
• 依托单位: University of California-Los Angeles
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1996
• 资助国家: 美国
• 起止时间: 1996-06-15 至 1998-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9622283&HistoricalAwards=false
• 关键词: National; Science; Foundation; Research; Equipment

9622283 Carmen This Research Equipment Grant will broaden the scope of the research and education being conducted in Department of Mechanical, Aerospace and Nuclear Engineering at the University of California, Los Angeles. The purchase of an unique sputtering system capable of depositing thin film TiNi onto various substrates is novel & should yield interesting and important results. Developing a dedicated ultra-high-high vacuum this sputtering system in a clean- room facility with lithographic capability will provide a nationally unique facility for thin film research at UCLA. If the sputtering equipment can be controlled so that the chemistry variations are small then the potential for a breakthrough is clearly present. Objectives are well-addressed and the need for such equipment is adequately described. Researchers have an excellent background for the proposed work and have demonstrated considerable productivity. ***

9622283卡门这项研究设备补助金将扩大研究和教育的范围正在进行的机械，航空航天和核工程系在加州，洛杉矶大学。 购买一个独特的溅射系统能够沉积薄膜TiNi到各种基板上是新颖的，应该产生有趣的和重要的结果。 开发一个专用的超高真空，这种溅射系统在一个清洁的房间设施与光刻能力，将提供一个全国唯一的设施，薄膜研究在加州大学洛杉矶分校。 如果可以控制溅射设备，使得化学变化很小，则明显存在突破的可能性。 目标得到了很好的解决，对这种设备的需求得到了充分的描述。 研究人员对拟议的工作有很好的背景，并表现出相当高的生产力。 ***