Molecular Beam Mass Spectrometry Studies of the Kinetics and Mechanism of the Thermal and Plasma-Enhanced Chemical Vapor Deposition of Transition and Main Group Nitrides

9631794 Amato-Weirda该研究计划资助解决了几种金属氮化物的热和等离子体增强化学气相沉积（CVD）的气相化学。 分子束质谱（MBMS）被耦合到一个快速流动的反应器，以监测原位和真实的时间气相物种和CVD反应的动力学。 将研究各种前体系统，包括过渡和主族金属M（NR 2）n和氨的均配二烷基酰胺络合物，以及更传统的系统，如金属卤化物（MX 4）和氨。热CVD研究还将研究单源前体，包括在不存在氨的情况下的Ti（NMe 2）4和Ti（NMe 2）3（t-Bu），以及TiCl 2（NHt-Bu）2（NHt-Bu）2 n。气相物种及其形成的动力学将被确定为反应条件的函数：温度，反应物的总压和分压，以及停留时间。 此外，薄膜将同时沉积，并且气相物质与薄膜特性相关，例如生长速率、化学计量和组成。在分子水平上对气相化学的理解对于未来通过化学气相沉积（CVD）进行材料合成的合理和显著改进至关重要。更重要的是，CVD气相化学和动力学的探索是必要的一般反应建模的发展，以及了解前体系统，反应模式，和最终的薄膜性能之间的关系。 虽然这个项目将主要集中在动力学和反应机制的研究，它也将有助于氮化物材料合成和加工问题的更广泛的了解。 规划补助金将帮助PI完成足够的初步工作，以显示想法的承诺或根据获得的数据修改它们。 因此，规划期间的支持将有助于PI准备更具竞争力的完整提案。***

9631794 Amato-Weirda This Research Planning Grant addresses gas-phase chemistry of thermal and plasma-enhanced chemical vapor deposition(CVD) of several metal nitrides. Molecular beam mass spectrometry (MBMS) is being coupled to a fast-flow reactor in order to monitor in situ and in real time gas-phase species and the kinetics of CVD reactions. Various precursor systems will be investigated including homoleptic dialkylamido complexes of transition and main group metals M(NR2)n and ammonia, and more traditional systems such as metal halides(MX4) and ammonia. Thermal CVD studies will also investigate single-source precursors including Ti(NMe2)4 and Ti(NMe2)3(t-Bu) in the absence of ammonia, and TiCl2(NHt-Bu)2(NHt-Bu)2 n. Gas-phase species and the kinetics of their formation will be determined as a function of reaction conditions: temperature, total and partial pressures of reactants, and residence time. Additionally, films will be deposited simultaneously and gas-phase species correlated to film properties such as, growth rate, stoichiometry, and composition. %%% The understanding of gas-phase chemistry at the molecular level is crucial for future rational and significant improvement in materials synthesis by chemical vapor deposition(CVD). More importantly the exploration of CVD gas-phase chemistry and kinetics is necessary for the development of general reaction modeling, as well as understanding the relationships among precursor systems, reactivity patterns, and final film properties. While this project will focus primarily on the study of kinetics and mechanisms of reactions, it will also contribute to a greater general understanding of nitrides materials synthesis and processing issues. The planning grant will aid the PI in accomplishing enough preliminary work to show the promise of ideas or to modify them based on the data acquired. Thus, support during the planning period will aid the PI in preparing a more competitive full proposal. ***