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Mechanical Testing and Microstructural Studies of MEMS Materials

Mechanical Testing and Microstructural Studies of MEMS Materials
MEMS 材料的机械测试和微观结构研究
批准号:
9634703
负责人:
William Sharpe
金额:
$30.47万
依托单位:
依托单位国家:
美国
项目类别:
Continuing Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-09-15 至 1999-08-31

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中文摘要
翻译
9634703这项研究旨在通过为非常小的试件提供机械性能来支持为微电子机械系统(MEMS)的设计提供坚实基础的努力。这种类型的数据可用于帮助优化小型设备的设计。之前NSF支持的努力已经导致了一种对厚度在3到300微米之间的硅规格进行测试的实验技术。这一新计划的努力将是确定MEMS材料薄样品的泊松比,并对其进行详细和全面的微观结构研究。最近的MEMS应用包括硅以外的略厚的材料样品。这些标本也将被调查。***
英文摘要
9634703 Sharpe This research is to support an effort that provides a solid foundation for the design of microelectromechanical systems (MEMS) by providing mechanical properties for very small specimens. This type data can be used to help optimize the designs of the small devices. Prior NSF supported efforts have led to an experimental technique for performing tests on silicon speaimens having a thickness between 3 and 300 micrometers. The efforts in this new program will be to determine Poison's ration for, and in conducting detailed and comprehensive microstructural studies of, thin specimens of the MEMS materials. Recent MEMS applications have involved slightly thicker specimens of materials other than silicon. Such specimens will also be investigated. ***
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Advanced Mechanical Testing of MEMS Materials
  • 批准号:
    9908097
  • 项目类别:
    Standard Grant
  • 资助金额:
    $24.0万
  • 财政年份:
    2000
  • 负责人:
    William Sharpe
  • 依托单位:
An Experimental Study of Strength and Fatigue Properties of Materials Used in Micromachines
  • 批准号:
    9313302
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $25.98万
  • 财政年份:
    1993
  • 负责人:
    William Sharpe
  • 依托单位:
A Study of Biaxial Strains at Notch Roots at High Temperature
  • 批准号:
    9016817
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $15.97万
  • 财政年份:
    1991
  • 负责人:
    William Sharpe
  • 依托单位:
The Effect of Notch Constraint on Low-Cycle Fatigue
  • 批准号:
    8702110
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $26.27万
  • 财政年份:
    1987
  • 负责人:
    William Sharpe
  • 依托单位:
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