Postdoc: Modelling of Advanced Semiconductor Materials for Electronic Devices

博士后：电子设备先进半导体材料建模

• 批准号: 9704686
• 负责人: Paulette Clancy
• 金额: $ 4.62万
• 依托单位: Cornell University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 1997
• 资助国家: 美国
• 起止时间: 1997-07-01 至 2000-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=9704686&HistoricalAwards=false
• 关键词: Postdoc; Modelling; Advanced; Semiconductor; Materials

This work involves AB intitio simulation studies for semiconductor materials processing. The project will provide the most careful test to date of the ability of approximate ab intitio tight binding models to predict the processing conditions necessary to produce desired materials properties. In particular, the PI's will study promising new dopants like Ga and In (to replace boron as a p-dopant) for semiconductor materials like Si and SiGe. This will involve a combination of simulation techniques (molecular statics, Molecular Dynamics and Kinetic Monte Carlo) to produce dopant diffusion profiles. The tight binding results for energies of formation and mobility of dopant species will be used in a continuum code to leverage the atomic-scale results to macroscopic scale properties. They will also investigate the role of stress, say at an SiGe/Si interface, to enhance lateral diffusion in a semiconductor device. The studies here, computer simulation of dopant diffusion in Si-rich materials, are crucial to the semiconductor industry aiming for sub-100nm device features in the 21st century. Close collaboration with local experimentalists and nearby industries will allow planning and execution of complementary experimental studies of these simulations.

这项工作涉及用于半导体材料处理的AB Intitio仿真研究。 该项目将提供最仔细的测试，以截至近似AB Intitio紧密结合模型预测产生所需材料特性所需的处理条件的能力。 特别是，PI将研究有希望的新掺杂剂，例如GA和IN（以P-opant的替换为P-Opant），用于SI和SIGE等半导体材料。这将涉及仿真技术（分子静态，分子动力学和动力学蒙特卡洛）的组合，以产生掺杂剂扩散曲线。 掺杂代码的形成能量和掺杂物种的迁移率的紧密结合结果将用于利用原子尺度的结果到宏观尺度的特性。 他们还将研究压力的作用，例如在SIGE/SI界面上，以增强半导体装置中的横向扩散。 这里的研究是，在富含SI的材料中，计算机模拟了掺杂剂扩散，对于半导体行业至关重要，目的是在21世纪旨在以下100nm设备功能。 与当地实验者和附近的行业进行密切合作，将允许对这些模拟进行补充实验研究。