GOALI: Development of a Cs Electrohydrodynamic Ion Source for High Spatial Resolution Secondary Ion Mass Spectrometry
目标:开发用于高空间分辨率二次离子质谱分析的 Cs 电流体动力离子源
基本信息
- 批准号:9705679
- 负责人:
- 金额:$ 15.97万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Continuing Grant
- 财政年份:1997
- 资助国家:美国
- 起止时间:1997-09-15 至 1999-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
Proposal Number: ECS-9705679 Principal Investigator: Jon Orloff Title: Development of a Cs electrohydrodynamic source for high spatial resolution secondary ion mass spectroscopy In this research, pursued under the NSF GOALI Program, an ion source for use in a secondary ion mass spectrometer (SIMS) system will be developed. The ion source will be based on cesium liquid metal materials, with ion emission through interaction of the liquid metal skin over a blunt field emitter solid tip in the presence of an intense electric field. A variety of cesium compounds that contain bromine, iodine and chlorine as well as oxygen will be studied. The source is expected to overcome the major limitations of present SIMS ion sources, in that it will be both high brightness and high resolution (0.1 micron). Current cesium-based sources only have a broad resolution of about one micron; gallium sources have high resolution but such low brightness that their use in a spectrometer system is limited. A high brightness, high spatial resolution ion source and spectrometer would have many applications in the microelectronics industry for direct surface analysis of circuits with dimensions of less than 0.25 microns.
提案编号:ECS-9705679 主要研究者:Jon Orloff 高空间分辨率二次离子质谱用铯电流体动力源的研制 在这项研究中,追求在NSF GOALI计划,离子源用于二次离子质谱仪(西姆斯)系统将被开发。离子源将基于铯液态金属材料,在强电场的存在下,通过在钝的场发射器固体尖端上的液态金属皮肤的相互作用来发射离子。 将研究含有溴、碘、氯和氧的各种铯化合物。 该源有望克服目前西姆斯离子源的主要局限性,因为它将是高亮度和高分辨率(0.1微米)。 目前的铯基源只有大约一微米的宽分辨率;镓源具有高分辨率,但亮度低,以至于它们在光谱仪系统中的使用受到限制。 高亮度、高空间分辨率的离子源和光谱仪在微电子工业中具有许多应用,用于尺寸小于0.25微米的电路的直接表面分析。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Jon Orloff其他文献
Gertrude Rempfer and the development of high resolution focused ion beam technology
- DOI:
10.1016/j.ultramic.2011.10.002 - 发表时间:
2012-08-01 - 期刊:
- 影响因子:
- 作者:
Jon Orloff - 通讯作者:
Jon Orloff
Design of a 100 kV, high resolution focused ion beam column with a liquid metal ion source
- DOI:
10.1016/0167-9317(85)90023-1 - 发表时间:
1985-12-01 - 期刊:
- 影响因子:
- 作者:
Jon Orloff;Pierre Sudraud - 通讯作者:
Pierre Sudraud
Jon Orloff的其他文献
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{{ truncateString('Jon Orloff', 18)}}的其他基金
U.S.-Japan Joint Seminar: High Resolution Focused Ion Beams/December 1990/Portland, OR
美日联合研讨会:高分辨率聚焦离子束/1990 年 12 月/俄勒冈州波特兰
- 批准号:
8915316 - 财政年份:1990
- 资助金额:
$ 15.97万 - 项目类别:
Standard Grant
Presidential Young Investigator Award: Applications of HighResolution Ion Optics and Liquid Metal Ion Sources (Physics)
总统青年研究员奖:高分辨率离子光学和液态金属离子源的应用(物理)
- 批准号:
8352076 - 财政年份:1984
- 资助金额:
$ 15.97万 - 项目类别:
Continuing grant
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