U.S.-Korea Cooperative Research on Growth and Characterization of (Ba,Sr)Tio3/(Ba,Sr)Ru03 Thin Film Systems

9728748 Ohuchi本奖项提供资金，允许华盛顿大学材料科学与工程系Fumio S.Ohuchi博士与韩国首尔汉阳大学无机材料工程系Duck-Kyun Choi博士开展为期36个月的合作研究计划，研究用于未来动态随机存取存储器(DRAM)应用的钙钛矿型薄膜异质系统的生长和表征。所要生长和表征的异质系统由铁电介质(Ba，Sr)TiO_3和导电材料(Ba，Sr)Ru_3组成。阐明控制杂化体系生长和性质的化学、动力学和结构约束的作用是一个主要目标。合作者将确定在新型DRAM结构中使用这些结构的可行性。这将通过(1)磁控溅射制备薄膜异质结构，(2)薄膜微结构的表征，以及(3)所得到的薄膜系统的性质的研究来实现，重点是在器件应用中的开发。合作的科学家和他们的实验室分别拥有互补的专业知识和设备，以发挥他们在这项研究中的作用。该项目与美韩合作科学计划的目标相关，该计划旨在通过交流科学信息、想法、技能和技术以及通过在互利问题上的合作来提高美国和韩国科学家和工程师之间的合作水平。韩国的参与得到了韩国科学与工程基金会(KOSEF)的支持。***

9728748 Ohuchi This award provides funds to permit Dr. Fumio S. Ohuchi, Department of Materials Science and Engineering, University of Washington, to pursue with Dr. Duck-Kyun Choi, Department of Inorganic Materials Engineering, Hanyang University, Seoul, Korea, for 36 months, a program of cooperative research on the growth and characterization of perovskite based thin film heterosystems for use in future Dynamic Random Access Memory (DRAM) applications. The heterosystems to be grown and characterized consist of (Ba, Sr)TiO3 as ferroelectric dielectric and (Ba, Sr)Ru O3 as conductive material. Elucidation of the roles of chemical, kinetic, and structural constraints controlling the growth and properties of the heterosystem is a major objective. The collaborators will determine the feasibility of using these structures in novel DRAM structures. This will be accomplished through studies of the (1) fabrication of thin film heterostructures by magnetron sputtering, (2) characterization of thin film microstructure, and (3) properties of the resultant thin film systems, with emphasis on exploitation in device applications. The cooperating scientists and their laboratories have complementary expertise and equipment, respectively, for their roles in pursuing this research.. This project is relevant to the objectives of the U.S.-Korea Cooperative Science Program which seeks to increase the level of cooperation between U.S. and Korean scientists and engineers through the exchange of scientific information, ideas, skills, and techniques and through collaboration on problems of mutual benefit. Korean participation is supported by the Korea Science and Engineering Foundation (KOSEF). ***