SBIR Phase II: An Advanced Computational Simulation Tool for Metalorganic Vapor Phase Epitaxy of Compound III-V Layers in Industrial Reactors
SBIR Phase II: An Advanced Computational Simulation Tool for Metalorganic Vapor Phase Epitaxy of Compound III-V Layers in Industrial Reactors
批准号:
9983415
负责人:
Samuel Lowry
金额:
$40.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-06-01 至 2003-05-31
中文摘要
这个小型企业创新研究第二阶段项目将产生一个商业模拟工具,以设计和优化用于制造III-V材料的金属有机气相外延(MOVPE)系统。 第一阶段研究证明了使用先进模型优化MOVPE设备和工艺的概念验证。 具体而言,辐射传热,气体流场,气相/表面化学和电磁感应加热的沉积速率/均匀性的影响进行了量化使用的模型。 初步验证后,模型进行了测试,为两个和三维的商业反应器的几何形状。 拟议的第二阶段项目将侧重于第一阶段研究期间确定的必要模型改进和开发。 具体地说,在三元和四元III-V族材料的建模化学、建立应变和生长速率之间的关系以及机制的开发方面寻求改进,所述机制可以在动力学和质量传输机制中准确地建模沉积。 光学,热力学/传输特性和反应机制的综合数据库将被实施,以确保拟议的模拟工具的商业成功。 模型开发之后,将与领先的MOVPE设备制造商之一Aixtron AG合作,对商业MOCVD反应器进行广泛的验证研究。 还将对来自公开文献以及目前与CFDRC合作的研究小组的反应器几何形状和案例进行验证。 第三阶段的工作将侧重于商业化方面,例如改进软件前端、改进数据处理和开发用于商业用途的虚拟反应堆原型。 拟议的模拟工具的可用性将有利于设计,优化和放大(大晶圆尺寸)的反应器/工艺MOVPE。 这将导致较低的设备和制造成本以及生长材料的改进的均匀性/质量。 因此,模拟工具将成为消除III-V MOVPE技术商业化的主要障碍的一项使能技术。 这也将对光电器件和电信行业的增长产生积极影响。
英文摘要
This Small Business Innovation Research Phase II project will produce a commercial simulation tool to design and optimize Metalorganic Vapor Phase Epitaxy (MOVPE) systems for the fabrication of III-V materials. The Phase I study has demonstrated the proof-of-concept of using advanced models to optimize MOVPE equipment and processes. Specifically the effects of radiative heat transfer, gas flow field, gas phase/surface chemistry and electromagnetic induction heating on the deposition rate/uniformity were quantified using the models. Following preliminary validation, the models were tested for both two and three-dimensional commercial reactor geometries. The proposed Phase II project will focus on the necessary model refinements and development identified during the Phase I study. Specifically, improvements are sought in the areas of modeling chemistry of ternary and quaternary III-V materials, establishing the relationship between strain and growth rate, and development of mechanisms, which can model deposition accurately both in the kinetic as well as the mass-transport regime. Comprehensive databases for optical, thermodynamic/transport properties, and reaction mechanisms will be implemented to ensure the commercial success of the proposed simulation tool. Model developments will be followed by extensive validation studies on commercial MOCVD reactors, to be conducted in collaboration with Aixtron AG, one of the leading MOVPE equipment manufacturers. Validations will also be performed on reactor geometries and cases available from the open literature as well as research groups currently working in collaboration with CFDRC. Phase III work will focus on commercialization aspects such as improvements in software frontends, improved data handling and development of virtual reactor prototypes for commercial use. The availability of the proposed simulation tool will facilitate the design, optimization and scale-up (to large wafer sizes) of reactors/processes for MOVPE. This will result in lower equipment and fabrication costs and improved uniformity/quality of the grown materials. Thus, the simulation tool will be an enabling technology in eliminating a major road block in the commercialization of III-V MOVPE technology. This will also have a positive impact on the growth of the optoelectronic device and telecommunication industries.
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SBIR Phase I: An Advanced Computational Simulation Tool for Metalorganic Vapor Phase Epitaxy of Compound III-V Layers in Industrial Reactors
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批准号:9861296
-
项目类别:Standard Grant
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资助金额:$10.0万
-
财政年份:1999
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负责人:Samuel Lowry
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依托单位:
国内基金
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