SBIR Phase II: Monochromatic Micro X-ray Fluorescence Analysis Using Toroidal Crystal Optics

SBIR 第二阶段：使用环形晶体光学器件进行单色微 X 射线荧光分析

• 批准号: 0091570
• 负责人: Zewu Chen
• 金额: $ 49.86万
• 依托单位: X-RAY OPTICAL SYSTEMS, INC.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2001
• 资助国家: 美国
• 起止时间: 2001-03-15 至 2003-02-28
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0091570&HistoricalAwards=false
• 关键词: SBIR; Phase; II; Monochromatic; Micro

This Small Business Innovation Research (SBIR) Phase II project will meet the demand from the microelectronics industry for an improved micro x-ray fluorescence instrument for thin film measurements. A new technique, monochromatic micro x-ray fluorescence (MMXRF) analysis using doublycurved crystal optics can meet this significant market need. A toroidal crystal can focus characteristic x-rays from a microfocus x-ray source based upon diffraction. The focused beam is monochromatic and the beam size is expected to be significantly smaller than that of current MXRF systems. This technique will provide high sensitivity and enhance excitation of low Z elements with the selection of beam energy. In addition, this technique will significantly increase the speed of high-energy x-ray measurements. A prototype MMXRF system will be developed that incorporates a modular dual beam system to probe samples with two energies simultaneously.The initial application of the technology is in the area of semiconductor manufacturing. As semiconductor manufacturing moves to larger wafers and higher levels of integration, a single wafer may require hundreds of steps. These wafers are expensive to produce and very difficult to repair. The instrument under development would provide elemental and thickness analysis to identify defective thin film deposition at the earliest opportunity, avoiding the considerable loss associated with rejections at the end of the production line.

这个小型企业创新研究（SBIR）第二阶段项目将满足微电子行业对用于薄膜测量的改进型微型X射线荧光仪器的需求。 一种新的技术，单色显微X射线荧光（MMXRF）分析使用双弯曲晶体光学可以满足这一显着的市场需求。 环形晶体可以根据衍射聚焦来自微焦点x射线源的特征x射线。聚焦光束是单色的，光束尺寸预计将明显小于目前的MXRF系统。 该技术将提供高灵敏度，并通过选择束能量来增强低Z元素的激发。此外，该技术将显著提高高能X射线测量的速度。 将开发一个MMXRF原型系统，该系统采用模块化双光束系统，可同时使用两种能量探测样品。该技术最初应用于半导体制造领域。随着半导体制造向更大的晶片和更高的集成度发展，单个晶片可能需要数百个步骤。 这些晶片生产昂贵并且非常难以修复。 正在开发的仪器将提供元素和厚度分析，以便尽早发现有缺陷的薄膜沉积，避免生产线末端出现废品造成的重大损失。