NIRT: Three-Dimensional Nanomanufacturing Processes for Nanophotonic Devices and Systems

这个纳米级跨学科研究团队（NIRT）项目的主要目标是在纳米制造的一个新领域建立一个跨学科的研究和教育计划，涉及制造具有工程缺陷的宽带隙三维（3D）光子晶体（PC）的可扩展工艺，并将其集成到光子器件和系统中。为了将光学元件小型化和集成到能够产生、处理和检测光信号的紧凑功能系统中，需要新的方法。pc被认为是实现这一目标的最有前途的技术之一。然而，制造可见光和红外光谱的三维光子禁隙（PBG）结构仍然是一个相当大的挑战。本提案提出了充分实现PC范例在工业应用和商业化方面的潜力的技术。构建模块将被涂覆纳米球。这种金属-介电纳米球的周期阵列呈现出宽、鲁棒和完整的PBG。传统上不相关的技术将用于制造和集成pc：原子层沉积（ALD）、胶体纳米球的自组装、3D飞秒纳米加工和光刻加工。自组装将与各向异性蚀刻相结合，以控制相对于其他光电元件的形状，厚度，方向和位置在硅片上的PC。超短激光脉冲纳米加工将用于制造定义良好的缺陷。几个表征技术将实施，以分析组成，结构和光学性质的PC，和设备。这项研究将提供对基本制造工艺的基本理解，如果成功，将建立前所未有的大规模集成纳米光子学制造技术。与国家标准与技术研究所和安捷伦技术实验室建立了伙伴关系。该项目的另一个目标是教育研究生和本科生以及公众在光子系统纳米制造领域及其对社会的影响。该项目将把教育和推广与纳米制造工艺的研究结合起来，为未来几年纳米光子学技术的发展创造必要的人类基础设施。该计划提出以下具体活动：(1)将研究成果纳入研究生和本科课程；(2)协调一个新的跨学科纳米制造系列研讨会；(3)组织有研究生参与的外展活动；(d)为公众建立和维护一个专门的网站；(4)与行业和国家实验室互动；(5)将已开发的基础设施提供给其他研究人员。

The primary objective of this Nanoscale Interdisciplinary Research Teams (NIRT) project is to establish an interdisciplinary research and education program in a new area of nanomanufacturing involving scalable processes for the fabrication of wide-band gap three-dimensional (3D) photonic crystals (PC) possessing engineered defects and their integration into photonic devices and systems. New approaches are needed for the miniaturization and integration of optical components into compact functional systems capable of generating, processing, and detecting light signals. PCs have been recognized as one of the most promising technologies for this goal. However, the fabrication of 3D photonic ban gap (PBG) structures for the visible and IR spectrum remains a considerable challenge. This proposal presents techniques to fully realize the potential of the PC paradigm for industrial application and commercialization. The building blocks will be coated nanospheres. Periodic arrays of such metal-dielectric nanospheres present a wide, robust, and complete PBG. Traditionally unrelated techniques will be used to fabricate and integrate the PCs: atomic layer deposition (ALD), self-assembly of colloidal nanospheres, 3D femtosecond nanomachining, and lithographic processing. Self-assembly will be combined with anisotropic etching to pattern the PC on silicon wafers with controlled shape, thickness, orientation and location relative to other opt electronic components. Ultra short laser pulse nanomachining will be used to create well-defined defects. Several characterization techniques will be implemented to analyze the composition, structure, and optical properties of the PC, and devices.This research will provide a fundamental understanding of basic manufacturing processes and, if successful, will establish an unprecedented large-scale integrated-nanophotonics fabrication technology. Partnerships have been established with the National Institute of Standards and Technologies and with Agilent technologies laboratories. Another objective of this project is to educate graduate and undergraduate students as well as the general public in the area of nanomanufacturing of photonic systems and its implications for society. The project will integrate education and outreach with research in nanomanufacturing processes to create the human infrastructure required for the development of nanophotonics technologies in the years to come. The program proposes the following specific activities: (1) to incorporate the outcome of research into graduate and undergraduate courses; (2) to coordinate a new interdisciplinary nanomanufacturing seminar series; (3) to organize outreach activities with graduate student participation, (d) to generate and maintain a dedicated website for the general public; (4) to interact with industry and national labs; and (5) to make available the developed infrastructure to other researchers.