NER: Expanding the Limits of Nanofabrication with Extreme Ultraviolet Light - (Theme: Manufacturing Processes at the Nanoscale)

NER:用极紫外光扩展纳米制造的极限 -(主题:纳米尺度的制造工艺)

基本信息

  • 批准号:
    0508484
  • 负责人:
  • 金额:
    $ 9.96万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2005
  • 资助国家:
    美国
  • 起止时间:
    2005-08-01 至 2007-07-31
  • 项目状态:
    已结题

项目摘要

This proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category NER. The objective of this research is to demonstrate a proof-of-principle nanopatterning process with the capability to write periodic patterns of nanometer-scale features of a variety of motives using compact table-top lasers emitting at short wavelengths, about 10 to 50 times shorter than visible light. The approach that will be pursued is multiple beam interferometric lithography. The method will exploit the coherence characteristics of these lasers to generate by interference periodic light patterns of different motives that will be used to write on photoresist. Through further processing these patterns will be transferred to substrates of interest such as ceramics or semiconductors to realize functional devices. The proposed research is significant as it promises to realize a nano-patterning scheme of unprecedented resolution thereby extending laser manufacturing to wavelengths only available until now at large synchrotron facilities. Furthermore, it promises the realization of a versatile table-top patterning tool that could easily be integrated with other processing tools in a laboratory environment. Such tool will enable the engineering of robust templates of controlled feature size for applications such as the growth of artificially engineered nanoscale magnetic materials for data storage, and nanoscale semiconducting and sub-wavelength optical materials for lightwave technologies. It will also impact the biological sciences, by providing scaffolds to immobilize proteins, and arrange DNA strands or molecules thereby enabling novel sensing and diagnostic tools. The proposed research will also offer unique opportunities for the training of students in an innovative and forward looking nano-technology. The combined research and education opportunities of this project will greatly benefit the US nanoscience and nanotechnology initiatives, which in turn have direct impact on electronics, biology, medicine, energy storage and material science among other fields, ultimately beneficiating society.
该提案是响应纳米科学与工程倡议,NSF 04-043,类别NER而收到的。这项研究的目的是展示一种原理验证纳米图案化过程,该过程能够使用短波长发射的紧凑型台式激光器写入各种动机的纳米级特征的周期性图案,短波长约为可见光的10至50倍。将追求的方法是多光束干涉光刻。该方法将利用这些激光器的相干特性,通过干涉产生不同动机的周期性光图案,这些图案将用于在光致抗蚀剂上写入。通过进一步的加工,这些图案将被转移到感兴趣的基底上,如陶瓷或半导体,以实现功能器件。 拟议的研究是重要的,因为它有望实现前所未有的分辨率的纳米图案化方案,从而将激光制造扩展到迄今为止仅在大型同步加速器设施中可用的波长。 此外,它承诺实现一个多功能的桌面图案化工具,可以很容易地与其他处理工具在实验室环境中集成。这种工具将使工程的鲁棒模板的控制功能大小的应用,如人工工程纳米磁性材料的数据存储的增长,和纳米半导体和亚波长光学材料的光波技术。它还将影响生物科学,通过为蛋白质提供支架,排列DNA链或分子,从而实现新的传感和诊断工具。拟议的研究还将为学生提供创新和前瞻性纳米技术培训的独特机会。该项目的研究和教育机会将大大有利于美国的纳米科学和纳米技术倡议,这反过来又对电子,生物,医学,能源储存和材料科学等领域产生直接影响,最终使社会繁荣。

项目成果

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Mario Marconi其他文献

Capture Efficiency of Integral Fume Extraction Torches for GMA Welding — Part 2
  • DOI:
    10.1007/bf03263486
  • 发表时间:
    2013-01-16
  • 期刊:
  • 影响因子:
    2.500
  • 作者:
    Mario Marconi;Albano Bravaccini
  • 通讯作者:
    Albano Bravaccini
Capture Efficiency of Integral Fume Extraction Torches for GMA Welding — Part 1
  • DOI:
    10.1007/bf03263477
  • 发表时间:
    2013-01-16
  • 期刊:
  • 影响因子:
    2.500
  • 作者:
    Mario Marconi;Albano Bravaccini
  • 通讯作者:
    Albano Bravaccini

Mario Marconi的其他文献

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{{ truncateString('Mario Marconi', 18)}}的其他基金

Collaborative Research: Defect-free nanofabrication of plasmonic structures
合作研究:等离子体结构的无缺陷纳米制造
  • 批准号:
    1507907
  • 财政年份:
    2015
  • 资助金额:
    $ 9.96万
  • 项目类别:
    Standard Grant
Table top EUV holography: a new approach for versatile nanolithography
桌面 EUV 全息术:多功能纳米光刻的新方法
  • 批准号:
    0901806
  • 财政年份:
    2009
  • 资助金额:
    $ 9.96万
  • 项目类别:
    Standard Grant

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