NER: Expanding the Limits of Nanofabrication with Extreme Ultraviolet Light - (Theme: Manufacturing Processes at the Nanoscale)
NER:用极紫外光扩展纳米制造的极限 -(主题:纳米尺度的制造工艺)
基本信息
- 批准号:0508484
- 负责人:
- 金额:$ 9.96万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2005
- 资助国家:美国
- 起止时间:2005-08-01 至 2007-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This proposal was received in response to Nanoscale Science and Engineering initiative, NSF 04-043, category NER. The objective of this research is to demonstrate a proof-of-principle nanopatterning process with the capability to write periodic patterns of nanometer-scale features of a variety of motives using compact table-top lasers emitting at short wavelengths, about 10 to 50 times shorter than visible light. The approach that will be pursued is multiple beam interferometric lithography. The method will exploit the coherence characteristics of these lasers to generate by interference periodic light patterns of different motives that will be used to write on photoresist. Through further processing these patterns will be transferred to substrates of interest such as ceramics or semiconductors to realize functional devices. The proposed research is significant as it promises to realize a nano-patterning scheme of unprecedented resolution thereby extending laser manufacturing to wavelengths only available until now at large synchrotron facilities. Furthermore, it promises the realization of a versatile table-top patterning tool that could easily be integrated with other processing tools in a laboratory environment. Such tool will enable the engineering of robust templates of controlled feature size for applications such as the growth of artificially engineered nanoscale magnetic materials for data storage, and nanoscale semiconducting and sub-wavelength optical materials for lightwave technologies. It will also impact the biological sciences, by providing scaffolds to immobilize proteins, and arrange DNA strands or molecules thereby enabling novel sensing and diagnostic tools. The proposed research will also offer unique opportunities for the training of students in an innovative and forward looking nano-technology. The combined research and education opportunities of this project will greatly benefit the US nanoscience and nanotechnology initiatives, which in turn have direct impact on electronics, biology, medicine, energy storage and material science among other fields, ultimately beneficiating society.
该提案是根据NSF 04-043,NER类别收到的。这项研究的目的是证明原本纳米图案的过程,具有使用紧凑型台式激光器在短波长下发射的各种动机的纳米尺度特征的周期性模式,比可见光短约10至50倍。将要采用的方法是多个光束干涉光刻。该方法将利用这些激光器的相干特性来通过干涉的不同动机的干扰周期光模式来生成,这些模式将用于写作抗光抗命抗光仪。通过进一步处理这些模式,这些模式将被转移到感兴趣的基板上,例如陶瓷或半导体,以实现功能设备。 拟议的研究非常重要,因为它有望实现前所未有的分辨率的纳米图案方案,从而将激光制造扩展到仅在大型同步器设施中可用的波长。 此外,它承诺实现一种多功能台式图案工具,该工具可以很容易地与实验室环境中的其他处理工具集成在一起。这种工具将使可控功能大小的强大模板能够用于应用程序,例如用于数据存储的人工设计的纳米级磁性材料,以及用于Lightwave技术的纳米级半导体和次波长光学材料。它还将通过提供脚手架来固定蛋白质并排列DNA链或分子,从而影响生物科学,从而实现新颖的感测和诊断工具。拟议的研究还将为在创新和前瞻性的纳米技术中培训学生提供独特的机会。该项目的合并研究和教育机会将极大地使美国纳米科学和纳米技术计划受益,而这些计划反过来又对电子,生物学,医学,医学,能源存储和材料科学以及其他领域以及最终受益的社会产生了直接影响。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Mario Marconi其他文献
Mario Marconi的其他文献
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{{ truncateString('Mario Marconi', 18)}}的其他基金
Collaborative Research: Defect-free nanofabrication of plasmonic structures
合作研究:等离子体结构的无缺陷纳米制造
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1507907 - 财政年份:2015
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$ 9.96万 - 项目类别:
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Table top EUV holography: a new approach for versatile nanolithography
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0901806 - 财政年份:2009
- 资助金额:
$ 9.96万 - 项目类别:
Standard Grant
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