Writing graphene: Ion-beam modification of thin polymer layers

写入石墨烯：薄聚合物层的离子束改性

• 批准号: 173836630
• 负责人: Professor Dr. Paul Müller (†)
• 金额: --
• 依托单位: Fachgebiet Angewandte Physik/Sensorik
• 依托单位国家: 德国
• 项目类别: Priority Programmes
• 财政年份: 2010
• 资助国家: 德国
• 起止时间: 2009-12-31 至 2014-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/173836630?language=en
• 关键词: Writing; graphene; Ion; beam; modification

We propose a radically new method of graphene growth. In contrast to exfoliation or surface layer reactions we will realize a horizontal graphene growth. Polymers or other carbon containing precursors will be converted into a graphene layer by ion irradiation in a specially developed scanning mode. In analogy with a zone melting process, the ion beam will move gradually along the precursor film initiating graphene growth at the beam border. By improving our scanning irradiation technique we plan to achieve a sharpness of the beam edge of the order of 1 nm. This value is comparable with the lateral size of a collision cascade in the graphitized layer as well as the size of graphene flakes. We expect that this procedure can provide large-area graphene films on arbitrary substrates. Raman spectroscopy, AFM, STM in ambient conditions and in UHV, SEM and TEM will be performed in order to investigate the process of graphene growth. Furthermore, the films will be characterized by measurements of their transport properties including influence of electric and magnetic fields, like Hall effect, etc. Several materials and deposition processes will be applied in order to obtain smooth, nanometer thick precursor layers. By using substrates, which assist graphene growth (Cu, Ni, Co etc.) we hope to achieve a significant reduction of the process temperatures by scanning ion irradiation, and expect interesting transport properties of the grown films.

我们提出了一种全新的石墨烯生长方法。与剥离或表面层反应相比，我们将实现石墨烯的水平生长。聚合物或其他含碳的前体将通过离子辐照在特殊开发的扫描模式下转化为石墨烯层。类似于区域熔化过程，离子束将沿着前驱薄膜逐渐移动，从而在束流边界启动石墨烯的生长。通过改进我们的扫描辐照技术，我们计划实现1纳米量级的光束边缘锐度。该值与石墨化层中碰撞级联的横向大小以及石墨烯薄片的大小相当。我们期望这个过程可以在任意的衬底上提供大面积的石墨烯薄膜。用拉曼光谱、原子力显微镜、扫描隧道显微镜、扫描电子显微镜、扫描电子显微镜和透射电子显微镜研究了石墨烯的生长过程。此外，薄膜将通过测量其传输性能来表征，包括电场和磁场的影响，如霍尔效应等。将采用多种材料和沉积工艺来获得光滑的、纳米厚的前驱层。通过使用有助于石墨烯生长的基质(铜、镍、钴等)。我们希望通过扫描离子辐照实现工艺温度的显著降低，并期待生长的薄膜具有有趣的输运性质。